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公开(公告)号：US20200089135A1
公开(公告)日：2020-03-19
申请号：US16470905
申请日：2017-11-15
发明人： Sebastianus Adrianus GOORDEN , Nitesh PANDEY , Duygu AKBULUT , Alessandro POLO , Simon Reinald HUISMAN
摘要： Disclosed is a metrology sensor system, such as a position sensor. The system comprises an optical collection system configured to collect diffracted or scattered radiation from a metrology mark on a substrate, said collected radiation comprising at least one parameter-sensitive signal and noise signal which is not parameter-sensitive, a processing system operable to process the collected radiation; and a module housing. An optical guide is provided for guiding the at least one parameter-sensitive signal, separated from the noise signal, from the processing system to a detection system outside of the housing. A detector detects the separated at least one parameter-sensitive signal. An obscuration for blocking zeroth order radiation and/or a demagnifying optical system may be provided between the optical guide and the detector.
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公开(公告)号：US20200103772A1
公开(公告)日：2020-04-02
申请号：US16611500
申请日：2018-03-06
发明人： Sebastianus Adrianus GOORDEN , Simon Reinald HUISMAN , Duygu AKBULUT , Alessandro POLO , Simon Gijsbert Josephus MATHIJSSEN
摘要： Disclosed is a metrology sensor apparatus and associated method. The metrology sensor apparatus comprises an illumination system operable to illuminate a metrology mark on a substrate with illumination radiation having a first polarization state and an optical collection system configured to collect scattered radiation, following scattering of the illumination radiation by the metrology mark. The metrology mark comprises a main structure and changes, relative to the first polarization state, at least one of a polarization state of a first portion of the scattered radiation predominately resultant from scattering by the main structure and a polarization state of a second portion of radiation predominately resultant from scattering by one or more features other than the main structure, such that the polarization state of the first portion of the scattered radiation is different to the polarization state of the second portion of the scattered radiation. The metrology sensor apparatus further comprises an optical filtering system which filters out the second portion of the scattered radiation based on its polarization state.
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公开(公告)号：US20190212658A1
公开(公告)日：2019-07-11
申请号：US16325471
申请日：2017-06-30
发明人： Simon Reinald HUISMAN , Simon Gijsbert Josephus MATHIJSSEN , Sebastianus Adrianus GOORDEN , Duygu AKBULUT , Alessandro POLO
摘要： An alignment sensor for a lithographic apparatus has an optical system configured to deliver, collect and process radiation selectively in a first waveband (e.g. 500-900 nm) and/or in a second waveband (e.g. 1500-2500 nm). The radiation of the first and second wavebands share a common optical path in at least some portion of the optical system, while the radiation of the first waveband is processed by a first processing sub-system and the radiation of the second waveband is processed by a second processing sub-system. The processing subsystems in one example include self-referencing interferometers. The radiation of the second waveband allows marks to be measured through an opaque layer. Optical coatings and other components of each processing sub-system can be tailored to the respective waveband, without completely duplicating the optical system.
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公开(公告)号：US20180292757A1
公开(公告)日：2018-10-11
申请号：US15941324
申请日：2018-03-30
IPC分类号： G03F7/20 , G03F9/00 , G01N21/47 , G01N21/95 , G01N21/956
摘要： A radiation receiving system for an inspection apparatus, used to perform measurements on target structures on lithographic substrates as part of a lithographic process, comprises a spectrometer with a number of inputs. The radiation receiving system comprises: a plurality of inputs, each input being arranged to provide radiation from a target structure; a first optical element operable to receive radiation from each of the plurality of inputs; a second optical element operable to receive radiation from the first optical element and to scatter the radiation; and a third optical element operable to direct the scattered radiation onto a detector. The second optical element may for example be a reflective diffraction grating that diffracts incoming radiation into an output radiation spectrum.
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公开(公告)号：US20170255104A1
公开(公告)日：2017-09-07
申请号：US15444765
申请日：2017-02-28
CPC分类号： G03F9/7046 , G01B11/00 , G01B11/02 , G01B11/24 , G01B11/272 , G01B11/303 , G01B2210/56 , G01N21/9501 , G01N21/956 , G02B2207/129 , G03F7/70625 , G03F7/70633 , G03F7/70775 , G03F7/7085 , G03F9/7069 , G03F9/7088
摘要： Disclosed is a metrology apparatus and method for measuring a structure formed on a substrate by a lithographic process. The metrology apparatus comprises an illumination system operable to provide measurement radiation comprising a plurality of wavelengths; and a hyperspectral imager operable to obtain a hyperspectral representation of a measurement scene comprising the structure, or a part thereof, from scattered measurement radiation subsequent to the measurement radiation being scattered by the structure.
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公开(公告)号：US20220100109A1
公开(公告)日：2022-03-31
申请号：US17415682
申请日：2019-12-12
发明人： Tamer Mohamed Tawfik Ahmed Mohamed ELAZHARY , Franciscus BIJNEN , Alessandro POLO , Kirill Urievich SOBOLEV , Simon Reinald HUISMAN , Justin Lloyd KREUZER
摘要： An apparatus for and method of determining the alignment of a substrate in which a multiple alignment marks are simultaneously illuminated with spatially coherent radiation and the light from the illuminated marks is collected in parallel to obtain information on the positions of the marks and distortions within the marks.
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公开(公告)号：US20210239654A1
公开(公告)日：2021-08-05
申请号：US17251533
申请日：2019-05-29
发明人： Alessandro POLO
摘要： A sensor apparatus comprising an acoustic assembly arranged to transmit an acoustic signal to a substrate and receive at least part of the acoustic signal after the acoustic signal has interacted with the substrate, a transducer arranged to convert the at least part of the acoustic signal to an electronic signal, and, a processor configured to receive the electronic signal and determine both a topography of at least part of the substrate and a position of a target of the substrate based on the electronic signal. The sensor apparatus may for part of a lithographic apparatus or a metrology apparatus.
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公开(公告)号：US20210055215A1
公开(公告)日：2021-02-25
申请号：US17092397
申请日：2020-11-09
发明人： Maxim PISARENCO , Nitesh PANDEY , Alessandro POLO
摘要： An acoustic scatterometer has an acoustic source operable to project acoustic radiation onto a periodic structure and formed on a substrate. An acoustic detector is operable to detect the −1st acoustic diffraction order diffracted by the periodic structure and while discriminating from specular reflection (0th order). Another acoustic detector is operable to detect the +1st acoustic diffraction order diffracted by the periodic structure, again while discriminating from the specular reflection (0th order). The acoustic source and acoustic detector may be piezo transducers. The angle of incidence of the projected acoustic radiation and location of the detectors and are arranged with respect to the periodic structure and such that the detection of the −1st and +1st acoustic diffraction orders and discriminates from the 0th order specular reflection.
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公开(公告)号：US20190049866A1
公开(公告)日：2019-02-14
申请号：US16069678
申请日：2017-01-16
发明人： Simon Reinald HUISMAN , Alessandro POLO , Duygu AKBULUT , Sebastianus Adrianus GOORDEN , Arie Jeffrey DEN BOEF
摘要： In an alignment sensor of a lithographic apparatus, position sensing radiation is delivered to a target (P1). After reflection or diffraction from the target, position sensing radiation is processed to determine a position of the target. Reference radiation interferes with the position sensing radiation) while a relative phase modulation is applied between the reference radiation and the position sensing radiation. The interfering radiation includes a time-varying component defined by the applied phase modulation. The interfering radiation is delivered to two photodetectors in such a way that each photodetector receives said time-varying component in anti-phase to that received at the other photodetector. A difference signal (i(t)) from said photodetectors contains an amplified, low noise version of said time-varying component. This is used in determining the position of the target. Mode matching enhances interference. Surface scattered radiation is rejected.
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公开(公告)号：US20210364936A1
公开(公告)日：2021-11-25
申请号：US16963273
申请日：2018-12-20
摘要： A sensor is disclosed, wherein a transducer generates acoustic waves, which are received by a lens assembly. The lens assembly transmits and directs at least a part of the acoustic waves to a target. The lens assembly then receives at least a part of acoustic waves, after interaction with the target. The sensor further comprises an optical detector that comprises at least one optically reflective member located at a surface of the lens assembly, which surface is arranged opposite to a surface of the lens assembly which faces a focal plane of the lens assembly, wherein the at least one optically reflective member is mechanically displaced in response to the acoustic waves, which are received and transmitted by the lens assembly.
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