- 专利标题: PROCESS OF CLEAN PRODUCTION OF ELECTRONIC GRADE HIGH-PURITY COPPER OXIDE
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申请号: US15871147申请日: 2018-01-15
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公开(公告)号: US20180179077A1公开(公告)日: 2018-06-28
- 发明人: Ze TAN , Siping Huang , Yilang Zhou , Wei He , Chong Wang , Haiyan Lu
- 申请人: Guangdong Guanghua Sci-Tech Co., Ltd. , Guangdong Toneset Science & Technology Co., Ltd.
- 优先权: CN201611205790.2 20161223
- 主分类号: C01G3/02
- IPC分类号: C01G3/02 ; B01D21/26
摘要:
The present disclosure provides a process of clean production of electronic grade high-purity copper oxide. The process includes (1) preparing a carbon-ammonia system solution with a certain ratio of CO2, NH3 and H2O; (2) dissolving copper under a slightly negative pressure and at a system temperature less than or equal to 60° C.; the reaction ends until the concentration of copper in the carbon-ammonia system solution reaches 80 to 140 g/L; (3) adding sodium polyacrylate; the reaction solution is heated to 60-80° C. under a reduced pressure for deamination; (4) disposing basic copper carbonate to separate the solid from the liquid by a centrifuge to give an filter cake and copper-containing clear solution; (5) calcining the filter cake at 250-600° C. for 1-5 hours to give an electronic grade high purity copper oxide; ammonia collected in step (3), the copper-containing clear solution collected in step (4), and carbon dioxide and water vapor collected in step (5) are transferred to the solution-preparing device of step (1) and directly used as raw materials for preparing carbonate-ammonia system solution, wherein the copper-containing clear solution is used as water. The process of production of the disclosure has a shortened processing line and a low energy consumption; it is not only cost saving but also can achieve goals of energy saving, reduced emission and environment pollution.
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