- 专利标题: VACUUM PUMP WITH ABATEMENT FUNCTION
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申请号: US15926844申请日: 2018-03-20
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公开(公告)号: US20180207580A1公开(公告)日: 2018-07-26
- 发明人: Toshiharu NAKAZAWA , Tetsuro SUGIURA , Kohtaro KAWAMURA , Toyoji SHINOHARA , Takashi KYOTANI , Keiichi ISHIKAWA , Seiji KASHIWAGI , Yasuhiko SUZUKI , Hideo ARAI
- 申请人: EBARA CORPORATION
- 优先权: JP2013-114275 20130530
- 主分类号: B01D53/74
- IPC分类号: B01D53/74
摘要:
A vacuum pump with abatement function is used for evacuating a chamber of a manufacturing apparatus. The vacuum pump with abatement function includes a vacuum pump having a discharge port to which one or more abatement parts for treating an exhaust gas discharged from the vacuum pump to make the exhaust gas harmless are attached. The one or more abatement parts are selected, depending on the amount and kind of the exhaust gas discharged from the vacuum pump, from plural kinds of abatement parts which have different treatment types of exhaust gas and/or different treatment amounts of exhaust gas.
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