Invention Application
- Patent Title: Topography Measurement System
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Application No.: US15764617Application Date: 2016-09-06
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Publication No.: US20180267415A1Publication Date: 2018-09-20
- Inventor: Nitesh PANDEY , Arie Jeffrey DEN BOEF , Heine Melle MULDER , Willem Richard PONGERS , Paulus Antonius Andreas TEUNISSEN
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Priority: EP15190027.1 20151015
- International Application: PCT/EP2016/070922 WO 20160906
- Main IPC: G03F9/00
- IPC: G03F9/00

Abstract:
A topography measurement system comprising a radiation source configured to generate a radiation beam, a spatially coded grating configured to pattern the radiation beam and thereby provide a spatially coded radiation beam, optics configured to form an image of the spatially coded grating at a target location on a substrate, detection optics configured to receive radiation re-fleeted from the target location of the substrate and form an image of the grating image at a second grating, and a detector configured to receive radiation transmitted through the second grating and produce an output signal.
Public/Granted literature
- US10394143B2 Topography measurement system Public/Granted day:2019-08-27
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