公开(公告)号：US20240184218A1

公开(公告)日：2024-06-06

申请号：US18441772

申请日：2024-02-14

Applicant: ASML Netherlands B.V.

Inventor： Nitesh PANDEY ,  Arie Jeffrey DEN BOEF ,  Duygu AKBULUT ,  Marinus Johannes Maria VAN DAM ,  Hans BUTLER ,  Hugo Augustinus Joseph CRAMER ,  Engelbertus Antonius Fransiscus VAN DER PASCH ,  Ferry ZIJP ,  Jeroen Arnoldus Leonardus Johannes RAAYMAKERS ,  Marinus Petrus REIJNDERS

IPC: G03F7/00 ,  G01N21/956

CPC classification number: G03F7/70625 ,  G01N21/956 ,  G03F7/7015 ,  G03F7/70633

Abstract: A metrology tool for determining a parameter of interest of a structure fabricated on a substrate, the metrology tool comprising: an illumination optical system for illuminating the structure with illumination radiation under a non-zero angle of incidence; a detection optical system comprising a detection optical sensor and at least one lens for capturing a portion of illumination radiation scattered by the structure and transmitting the captured radiation towards the detection optical sensor, wherein the illumination optical system and the detection optical system do not share an optical element.

公开(公告)号：US20240004313A1

公开(公告)日：2024-01-04

申请号：US18039373

申请日：2021-11-16

Applicant: ASML Netherlands B.V.

Inventor： Coen Adrianus VERSCHUREN ,  Ferry ZIJP ,  Nitesh PANDEY ,  Alexander Prasetya KONIJNENBERG

IPC: G03F7/00 ,  G01B11/27 ,  G01N21/956 ,  G02B27/64

CPC classification number: G03F7/706851 ,  G03F7/70633 ,  G03F7/7065 ,  G01B11/272 ,  G01N21/956 ,  G02B27/646 ,  G01N2201/063

Abstract: Disclosed is an optical imaging system, and associated method, comprising a stage module configured to support an object such that an area of the object is illuminated by an illumination beam; an objective lens configured to collect at least one signal beam, the at least one signal beam originating from the illuminated area of the object; an image sensor configured to capture an image formed by the at least one signal beam collected by the objective lens; and a motion compensatory mechanism operable to compensate for relative motion of the stage module with respect to the objective lens during an image acquisition. The motion compensatory mechanism causes a compensatory motion of one or more of: said objective lens or at least one optical element thereof; said image sensor; and/or an optical element comprised within a detection branch and/or illumination branch of the optical imaging system.

公开(公告)号：US20230044632A1

公开(公告)日：2023-02-09

申请号：US17787244

申请日：2020-10-21

Applicant: ASML Netherlands B.V.

Inventor： Willem Marie Julia Marcel COENE ,  Arie Jeffrey DEN BOEF ,  Vasco Tomas TENNER ,  Nitesh PANDEY ,  Christos MESSINIS ,  Johannes Fitzgerald DE BOER

IPC: G03H1/08 ,  G03H1/26

Abstract: A dark field digital holographic microscope is disclosed which is configured to determine a characteristic of interest of a structure. The dark field digital holographic microscope comprises an illumination device configured to provide at least: a first beam pair comprising a first illumination beam of radiation (1010) and a first reference beam of radiation (1030) and a second beam pair comprising a second illumination beam of radiation (1020) and a second reference beam of radiation (1040); and one or more optical elements (1070) operable to capture a first scattered radiation and to capture a second scattered radiation scattered by the structure resultant from the first and second illumination beams respectively. The beams of the first beam pair are mutually coherent and the beams of the second beam pair are mutually coherent. The illumination device is configured to impose incoherence (ADI) between the first beam pair and second beam pair.

公开(公告)号：US20220299886A1

公开(公告)日：2022-09-22

申请号：US17638975

申请日：2020-07-31

Applicant: ASML Netherlands B.V.

Inventor： Nitesh PANDEY ,  Alexander Prasetya KONIJNENBERG

IPC: G03F7/20 ,  G01N21/47

Abstract: Disclosed is a method of measuring a structure, and associated metrology device and computer program. The method comprises obtaining an amplitude profile of scattered radiation relating to a measurement of a first structure on a first substrate and obtaining a reference phase profile relating to a reference measurement of at least one reference structure on a reference substrate. The at least one reference structure is not the same structure as said first structure but is nominally identical in terms of at least a plurality of key parameters. The method further comprises determining a complex-valued field to describe the first structure from the amplitude profile and reference phase profile.

公开(公告)号：US20200004165A1

公开(公告)日：2020-01-02

申请号：US16562869

申请日：2019-09-06

Applicant: ASML NETHERLANDS B.V.

Inventor： Janneke RAVENSBERGEN ,  Duygu AKBULUT ,  Nitesh PANDEY ,  Jin LIAN

IPC: G03F7/20 ,  G01B9/02

Abstract: A metrology apparatus is disclosed that has an optical system to focus radiation onto a structure and directs redirected radiation from the structure to a detection system. The optical system applies a plurality of different offsets of an optical characteristic to radiation before and/or after redirected by the structure, such that a corresponding plurality of different offsets are provided to redirected radiation derived from a first point of a pupil plane field distribution relative to redirected radiation derived from a second point of the pupil plane field distribution. The detection system detects a corresponding plurality of radiation intensities resulting from interference between the redirected radiation derived from the first point of the pupil plane field distribution and the redirected radiation derived from the second point of the pupil plane field distribution. Each radiation intensity corresponds to a different one of the plurality of different offsets.

公开(公告)号：US20190294054A1

公开(公告)日：2019-09-26

申请号：US16441832

申请日：2019-06-14

Applicant: ASML Netherlands B.V.

Inventor： Nitesh PANDEY ,  Zili ZHOU

IPC: G03F7/20

Abstract: Methods of measuring a target formed by a lithographic process, a metrology apparatus and a polarizer assembly are disclosed. The polarizer assembly comprises a polarizing structure having a substantially planar form and configured to polarize radiation passing there through in a circular polarizing region. The circular polarizing region is configured to apply a first polarization to radiation passing through a first one of two pairs of diametrically opposite quadrants of the circular polarizing region and to apply a second polarization, orthogonal to the first polarization, to radiation passing through a second one of two pairs of diametrically opposite quadrants of the circular polarizing region.

公开(公告)号：US20190250094A1

公开(公告)日：2019-08-15

申请号：US16268564

申请日：2019-02-06

Applicant: ASML NETHERLANDS B.V.

Inventor： Nitesh PANDEY ,  Zili ZHOU ,  Gerbrand VAN DER ZOUW ,  Arie Jeffrey DEN BOEF ,  Markus Gerardus Martinus Maria VAN KRAAIJ ,  Armand Eugene Albert KOOLEN ,  Hugo Augustinus Joseph CRAMER ,  Paul Christiaan HINNEN ,  Martinus Hubertus Maria VAN WEERT ,  Anagnostis TSIATMAS ,  Shu-jin WANG ,  Bastiaan Onne FAGGINGER AUER ,  Alok VERMA

IPC: G01N21/21 ,  G01N21/88 ,  G03F7/20

CPC classification number: G01N21/21 ,  G01N21/8806 ,  G01N2021/8848 ,  G03F7/70191 ,  G03F7/70616 ,  G03F7/70625 ,  G03F7/70633

Abstract: An inspection apparatus, method, and system are described herein. An example inspection apparatus includes an optical system and an imaging system. The optical system may be configured to output an illumination beam incident on a target including one or more features, the illumination beam polarized with a first polarization when incident on the target. The imaging system may be configured to obtain intensity data representing at least a portion of the illumination beam scattered by the one or more features, where the portion of the illumination beam has a second polarization orthogonal to the first polarization. The inspection apparatus may be further configured to generate image data representing an image of each of the feature(s) based on the intensity data, and determine a measurement of a parameter of interest associated with the feature(s) based on an amount of the portion of the illumination beam having the second polarization.

公开(公告)号：US20180292757A1

公开(公告)日：2018-10-11

申请号：US15941324

申请日：2018-03-30

Applicant: ASML Netherlands B.V.

Inventor： Alessandro POLO ,  Nitesh PANDEY ,  Armand Eugene Albert KOOLEN

IPC: G03F7/20 ,  G03F9/00 ,  G01N21/47 ,  G01N21/95 ,  G01N21/956

Abstract: A radiation receiving system for an inspection apparatus, used to perform measurements on target structures on lithographic substrates as part of a lithographic process, comprises a spectrometer with a number of inputs. The radiation receiving system comprises: a plurality of inputs, each input being arranged to provide radiation from a target structure; a first optical element operable to receive radiation from each of the plurality of inputs; a second optical element operable to receive radiation from the first optical element and to scatter the radiation; and a third optical element operable to direct the scattered radiation onto a detector. The second optical element may for example be a reflective diffraction grating that diffracts incoming radiation into an output radiation spectrum.

公开(公告)号：US20160061750A1

公开(公告)日：2016-03-03

申请号：US14838268

申请日：2015-08-27

Applicant: Vrije Universiteit Amsterdam ,  Universiteit van Amsterdam ,  Stichting voor Fundamenteel Onderzoek der Materie ,  ASML Netherlands B.V.

Inventor： Arie Jeffrey DEN BOEF ,  Simon Gijsbert Josephus MATHIJSSEN ,  Nitesh PANDEY ,  Stefan Michiel WITTE ,  Kjeld EIKEMA

IPC: G01N21/956 ,  G03F7/20 ,  G01B11/00

CPC classification number: G01N21/956 ,  G01B11/00 ,  G01N2201/12 ,  G03F7/70141 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/70641 ,  G03H1/0443 ,  G03H2001/0033 ,  G03H2001/0204 ,  G03H2001/0458

Abstract: Metrology targets are formed on a substrate (W) by a lithographic process. A target (T) comprising one or more grating structures is illuminated with spatially coherent radiation under different conditions. Radiation (650) diffracted by from said target area interferes with reference radiation (652) interferes with to form an interference pattern at an image detector (623). One or more images of said interference pattern are captured. From the captured image(s) and from knowledge of the reference radiation a complex field of the collected scattered radiation at the detector. A synthetic radiometric image (814) of radiation diffracted by each grating is calculated from the complex field. From the synthetic radiometric images (814, 814′) of opposite portions of a diffractions spectrum of the grating, a measure of asymmetry in the grating is obtained. Using suitable targets, overlay and other performance parameters of the lithographic process can be calculated from the measured asymmetry.

Abstract translation: 通过光刻工艺在基板（W）上形成计量目标。 包括一个或多个光栅结构的靶（T）在不同条件下被空间相干辐射照射。 从参考辐射（652）干涉的所述目标区域衍射的辐射（650）干扰以在图像检测器（623）处形成干涉图案。 捕获所述干涉图案的一个或多个图像。 从捕获的图像和参考辐射的知识中，在检测器处收集的散射辐射的复杂场。 从复场计算由每个光栅衍射的辐射的合成辐射图像（814）。 从光栅的衍射光谱的相对部分的合成辐射图像（814,814'）获得光栅中的不对称度。 使用合适的目标，可以从测量的不对称性计算光刻过程的覆盖层和其他性能参数。

公开(公告)号：US20240004184A1

公开(公告)日：2024-01-04

申请号：US18037957

申请日：2021-11-08

Applicant: ASML Netherlands B.V.

Inventor： Luc Roger Simonne HASPESLAGH ,  Nitesh PANDEY ,  Ties Wouter VAN DER WOORD ,  Halil Gökay YEGEN ,  Sebastianus Adrianus GOORDEN ,  Alexis HUMBLET ,  Alexander Ludwig KLEIN ,  Jim Vincent OVERKAMP ,  Guilherme BRONDANI TORRI ,  Edgar Alberto OSORIO OLIVEROS

IPC: G02B26/08 ,  G03F7/00 ,  B81B7/02

CPC classification number: G02B26/0858 ,  G03F7/70291 ,  G03F7/70116 ,  B81B7/02 ,  B81B2207/11 ,  B81B2207/015

Abstract: A micromirror array comprises a substrate, a plurality of mirrors for reflecting incident light and, for each mirror of the plurality of mirrors, at least one piezoelectric actuator for displacing the mirror, wherein the at least one piezoelectric actuator is connected to the substrate. The micromirror array further comprises one or more pillars connecting the mirror to the at least one piezoelectric actuator. Also disclosed is a method of forming such a micromirror array. The micromirror array may be used in a programmable illuminator. The programmable illuminator may be used in a lithographic apparatus and/or in an inspection and/or metrology apparatus.