-
公开(公告)号：US20240004184A1
公开(公告)日：2024-01-04
申请号：US18037957
申请日：2021-11-08
发明人： Luc Roger Simonne HASPESLAGH , Nitesh PANDEY , Ties Wouter VAN DER WOORD , Halil Gökay YEGEN , Sebastianus Adrianus GOORDEN , Alexis HUMBLET , Alexander Ludwig KLEIN , Jim Vincent OVERKAMP , Guilherme BRONDANI TORRI , Edgar Alberto OSORIO OLIVEROS
CPC分类号： G02B26/0858 , G03F7/70291 , G03F7/70116 , B81B7/02 , B81B2207/11 , B81B2207/015
摘要： A micromirror array comprises a substrate, a plurality of mirrors for reflecting incident light and, for each mirror of the plurality of mirrors, at least one piezoelectric actuator for displacing the mirror, wherein the at least one piezoelectric actuator is connected to the substrate. The micromirror array further comprises one or more pillars connecting the mirror to the at least one piezoelectric actuator. Also disclosed is a method of forming such a micromirror array. The micromirror array may be used in a programmable illuminator. The programmable illuminator may be used in a lithographic apparatus and/or in an inspection and/or metrology apparatus.
-
公开(公告)号：US20230062585A1
公开(公告)日：2023-03-02
申请号：US17856213
申请日：2022-07-01
发明人： Patricius Aloysius Jacobus TINNEMANS , Arie Jeffrey DEN BOEF , Armand Eugene Albert KOOLEN , Nitesh PANDEY , Vasco Tomas TENNER , Willem Marie Julia Marcel COENE , Patrick WARNAAR
摘要： Described is a metrology system for determining a characteristic of interest relating to at least one structure on a substrate, and associated method. The metrology system comprises a processor being configured to computationally determine phase and amplitude information from a detected characteristic of scattered radiation having been reflected or scattered by the at least one structure as a result of illumination of said at least one structure with illumination radiation in a measurement acquisition, and use the determined phase and amplitude to determine the characteristic of interest.
-
公开(公告)号：US20220342199A1
公开(公告)日：2022-10-27
申请号：US17634023
申请日：2020-08-05
申请人： ASML NETHERLANDS B.V. , IMEC v.z.w.
发明人： Alexandre HALBACH , Nitesh PANDEY , Sebastianus Adrianus GOORDEN , Veronique ROCHUS , Luc Roger Simonne HASPESLAGH , Guilherme BRONDANI TORRI
摘要： A micromirror array includes a substrate, a plurality of mirrors for reflecting incident radiation, and for each mirror of the plurality of mirrors, a respective post connecting the substrate to the respective mirror. The micromirror array further includes, for each mirror of the plurality of mirrors, one or more electrostatic actuators connected to the substrate for applying force to the respective post to displace the respective post relative to the substrate, thereby displacing the respective mirror. Also disclosed is a method of forming such a micromirror array. The micromirror array may be used in a programmable illuminator. The programmable illuminator may be used in a lithographic apparatus and/or in an inspection apparatus.
-
公开(公告)号：US20220334497A1
公开(公告)日：2022-10-20
申请号：US17636830
申请日：2020-07-15
发明人： Nitesh PANDEY
IPC分类号： G03F7/20
摘要： Disclosed is a detection apparatus for a metrology device operable to measure a parameter of interest from scattered radiation having been scattered from a sample. The detection device comprises a detector comprising an array of pixels. The array of pixels comprises imaging pixels for detecting an image from which the parameter of interest is determined, and direction detecting pixels for detecting the angle of incidence of said scattered radiation on said detector.
-
5.发明申请公开(公告)号：US20200249584A1
公开(公告)日：2020-08-06
申请号：US16856128
申请日：2020-04-23
IPC分类号： G03F7/20 , G01N21/88 , G01B11/27 , G01N21/956
摘要： A method of adjusting a metrology apparatus, the method including: spatially dividing an intensity distribution of a pupil plane of the metrology apparatus into a plurality of pixels; and reducing an effect of a structural asymmetry in a target on a measurement by the metrology apparatus on the target, by adjusting intensities of the plurality of pixels.
-
公开(公告)号：US20200072599A1
公开(公告)日：2020-03-05
申请号：US16558457
申请日：2019-09-03
摘要： A metrology apparatus for determining a characteristic of interest of a structure on a substrate, the apparatus comprising: a radiation source for generating illumination radiation; at least two illumination branches for illuminating the structure on the substrate, the illumination branches being configured to illuminate the structure from different angles; and a radiation switch configured to receive the illumination radiation and transfer at least part of the radiation to a selectable one of the at least two illumination branches.
-
公开(公告)号：US20200057387A1
公开(公告)日：2020-02-20
申请号：US16540145
申请日：2019-08-14
发明人： Nitesh PANDEY
IPC分类号： G03F7/20 , G01N21/956 , G01N21/47
摘要： A metrology apparatus for determining a parameter of interest of a structure formed by a lithographic process on a substrate, the metrology apparatus comprising: an illuminator for illuminating the structure; a lens for collecting at least a portion of radiation diffracted from the structure; and an image sensor for receiving and obtaining a recording of the collected diffracted radiation; wherein the illuminator comprises at least one optical fiber for illuminating the structure directly.
-
公开(公告)号：US20190072859A1
公开(公告)日：2019-03-07
申请号：US16117614
申请日：2018-08-30
IPC分类号： G03F7/20
摘要： A method comprising: evaluating a plurality of polarization characteristics associated with measurement of a metrology target of a substrate processed using a patterning process, against one or more measurement quality parameters; and selecting one or more polarization characteristics from the plurality of polarization characteristics based on one or more of the measurement quality parameters
-
公开(公告)号：US20180246423A1
公开(公告)日：2018-08-30
申请号：US15754470
申请日：2016-08-22
发明人： Simon Gijsbert Josephus MATHIJSSEN , Arie Jeffrey DEN BOEF , Nitesh PANDEY , Patricius Aloysius Jacobus TINNEMANS , Stefan Michiel WITTE , Kjeld Sijbrand Eduard EIKEMA
CPC分类号： G03F9/7003 , G01B11/272 , G03F9/7046 , G03F9/7088 , G03F9/7092 , G06T7/73
摘要： A lithographic apparatus comprises comprise a substrate table constructed to hold a substrate; and a sensor configured to sense a position of an alignment mark provided onto the substrate held by the substrate table. The sensor comprises a source of radiation configured to illuminate the alignment mark with a radiation beam, a detector configured to detect the radiation beam, having interacted with the alignment mark, as an out of focus optical pattern, and a data processing system. The data processing system is configured to receive image data representing the out of focus optical pattern, and process the image data for determining alignment information, comprising applying a lensless imaging algorithm to the out of focus optical pattern.
-
公开(公告)号：US20240184218A1
公开(公告)日：2024-06-06
申请号：US18441772
申请日：2024-02-14
发明人： Nitesh PANDEY , Arie Jeffrey DEN BOEF , Duygu AKBULUT , Marinus Johannes Maria VAN DAM , Hans BUTLER , Hugo Augustinus Joseph CRAMER , Engelbertus Antonius Fransiscus VAN DER PASCH , Ferry ZIJP , Jeroen Arnoldus Leonardus Johannes RAAYMAKERS , Marinus Petrus REIJNDERS
IPC分类号： G03F7/00 , G01N21/956
CPC分类号： G03F7/70625 , G01N21/956 , G03F7/7015 , G03F7/70633
摘要： A metrology tool for determining a parameter of interest of a structure fabricated on a substrate, the metrology tool comprising: an illumination optical system for illuminating the structure with illumination radiation under a non-zero angle of incidence; a detection optical system comprising a detection optical sensor and at least one lens for capturing a portion of illumination radiation scattered by the structure and transmitting the captured radiation towards the detection optical sensor, wherein the illumination optical system and the detection optical system do not share an optical element.
-
-
-
-
-
-
-
-
-
搜索结果
49 条记录 (耗时 0.024 秒)
