- 专利标题: Two-Dimensional Graphene Cold Cathode, Anode, and Grid
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申请号: US15730212申请日: 2017-10-11
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公开(公告)号: US20180294131A1公开(公告)日: 2018-10-11
- 发明人: David Glen Findley
- 申请人: Lockheed Martin Corporation
- 主分类号: H01J1/304
- IPC分类号: H01J1/304 ; H01J1/48 ; H01J21/10 ; H01J9/02 ; B05D1/00
摘要:
In an embodiment, a method includes forming a first diamond layer on a substrate and inducing a layer of graphene from the first diamond layer by heating the substrate and the first diamond layer. The method includes forming a second diamond layer on top of the layer of graphene and applying a mask to the second diamond layer. The mask includes a shape of a cathode, an anode, and one or more grids. The method further includes forming a two-dimensional cold cathode, a two-dimensional anode, and one or more two-dimensional grids by reactive-ion electron-beam etching. Each of the two-dimensional cold cathode, the two-dimensional anode, and the one or more two-dimensional grids includes a portion of the first diamond layer, the graphene layer, and the second diamond layer such that the graphene layer is positioned between the first diamond layer and the second diamond layer.
公开/授权文献
- US10186394B2 Two-dimensional graphene cold cathode, anode, and grid 公开/授权日:2019-01-22
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