- 专利标题: SUBSTRATE BONDING APPARATUS AND SUBSTRATE BONDING METHOD
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申请号: US16019923申请日: 2018-06-27
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公开(公告)号: US20180308770A1公开(公告)日: 2018-10-25
- 发明人: Isao SUGAYA , Eiji ARIIZUMI , Yoshiaki KITO , Mikio USHIJIMA , Masanori ARAMATA , Naoto KIRIBE , Hiroshi SHIRASU , Hajime MITSUISHI , Minoru FUKUDA , Masaki TSUNODA
- 申请人: NIKON CORPORATION
- 申请人地址: JP Tokyo
- 专利权人: NIKON CORPORATION
- 当前专利权人: NIKON CORPORATION
- 当前专利权人地址: JP Tokyo
- 优先权: JP2015-256845 20151228
- 主分类号: H01L21/66
- IPC分类号: H01L21/66 ; H01L23/00
摘要:
To improve the throughput of substrate bonding. A substrate bonding apparatus that bonds first and second substrates so that contact regions in which the first and second substrates contact are formed in parts of the first and second substrates and the contact regions enlarge from the parts, the apparatus including: a detecting unit detecting information about the contact regions; and a determining unit determining that the first and second substrates can be carried out based on the information detected at the detecting unit. In the substrate bonding apparatus, the information may be information, a value of which changes according to progress of enlargement of the contact regions, and the determining unit may determine that the first and second substrates can be carried out if the value becomes constant or if a rate of changes in the value becomes lower than a predetermined value.
公开/授权文献
- US11791223B2 Substrate bonding apparatus and substrate bonding method 公开/授权日:2023-10-17
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