Invention Application
- Patent Title: LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
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Application No.: US16026195Application Date: 2018-07-03
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Publication No.: US20180314169A1Publication Date: 2018-11-01
- Inventor: Timotheus Franciscus SENGERS , Marcus Adrianus Van De Kerkhof , Mark Kroon , Kees Van Weert
- Applicant: ASML Netherlands B. V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B. V.
- Current Assignee: ASML Netherlands B. V.
- Current Assignee Address: NL Veldhoven
- Priority: EP03255395.0 20030829
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03F9/00
Abstract:
A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final element of the radiation detector.
Public/Granted literature
- US10514618B2 Lithographic apparatus and device manufacturing method Public/Granted day:2019-12-24
Information query
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