公开(公告)号：US20180314169A1

公开(公告)日：2018-11-01

申请号：US16026195

申请日：2018-07-03

Applicant: ASML Netherlands B. V.

Inventor： Timotheus Franciscus SENGERS ,  Marcus Adrianus Van De Kerkhof ,  Mark Kroon ,  Kees Van Weert

IPC: G03F7/20 ,  G03F9/00

CPC classification number: G03F7/70775 ,  G03F7/70058 ,  G03F7/70191 ,  G03F7/70341 ,  G03F7/7055 ,  G03F7/707 ,  G03F7/7085 ,  G03F9/7088

Abstract: A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final element of the radiation detector.

公开(公告)号：US10514618B2

公开(公告)日：2019-12-24

申请号：US16026195

申请日：2018-07-03

Applicant: ASML NETHERLANDS B. V.

Inventor： Timotheus Franciscus Sengers ,  Marcus Adrianus Van De Kerkhof ,  Mark Kroon ,  Kees Van Weert

IPC: G03B27/58 ,  G03F7/20 ,  G03F9/00

Abstract: A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final element of the radiation detector.