Invention Application
- Patent Title: MODULATION PATTERN CALCULATION DEVICE, LIGHT CONTROL DEVICE, MODULATION PATTERN CALCULATION METHOD, MODULATION PATTERN CALCULATION PROGRAM, AND STORAGE MEDIUM
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Application No.: US15573900Application Date: 2016-05-11
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Publication No.: US20180348549A1Publication Date: 2018-12-06
- Inventor: Koyo WATANABE , Takashi INOUE , Koji TAKAHASHI
- Applicant: HAMAMATSU PHOTONICS K.K.
- Applicant Address: JP Hamamatsu-shi, Shizuoka
- Assignee: HAMAMATSU PHOTONICS K.K.
- Current Assignee: HAMAMATSU PHOTONICS K.K.
- Current Assignee Address: JP Hamamatsu-shi, Shizuoka
- Priority: JP2015-100085 20150515
- International Application: PCT/JP2016/064031 WO 20160511
- Main IPC: G02F1/01
- IPC: G02F1/01

Abstract:
A modulation pattern calculation apparatus includes an iterative Fourier transform unit, a filtering process unit, and a modulation pattern calculation unit. The iterative Fourier transform unit performs a Fourier transform on a waveform function including an intensity spectrum function and a phase spectrum function, performs a replacement of a temporal intensity waveform function based on a desired waveform after the Fourier transform and then performs an inverse Fourier transform, and performs a replacement to constrain the phase spectrum function after the inverse Fourier transform. The filtering process unit performs a filtering process of cutting a part exceeding a cutoff intensity for each wavelength, on the intensity spectrum function in a frequency domain.
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