• Patent Title: MODULATION PATTERN CALCULATION DEVICE, LIGHT CONTROL DEVICE, MODULATION PATTERN CALCULATION METHOD, MODULATION PATTERN CALCULATION PROGRAM, AND STORAGE MEDIUM
  • Application No.: US15573900
    Application Date: 2016-05-11
  • Publication No.: US20180348549A1
    Publication Date: 2018-12-06
  • Inventor: Koyo WATANABETakashi INOUEKoji TAKAHASHI
  • Applicant: HAMAMATSU PHOTONICS K.K.
  • Applicant Address: JP Hamamatsu-shi, Shizuoka
  • Assignee: HAMAMATSU PHOTONICS K.K.
  • Current Assignee: HAMAMATSU PHOTONICS K.K.
  • Current Assignee Address: JP Hamamatsu-shi, Shizuoka
  • Priority: JP2015-100085 20150515
  • International Application: PCT/JP2016/064031 WO 20160511
  • Main IPC: G02F1/01
  • IPC: G02F1/01
MODULATION PATTERN CALCULATION DEVICE, LIGHT CONTROL DEVICE, MODULATION PATTERN CALCULATION METHOD, MODULATION PATTERN CALCULATION PROGRAM, AND STORAGE MEDIUM
Abstract:
A modulation pattern calculation apparatus includes an iterative Fourier transform unit, a filtering process unit, and a modulation pattern calculation unit. The iterative Fourier transform unit performs a Fourier transform on a waveform function including an intensity spectrum function and a phase spectrum function, performs a replacement of a temporal intensity waveform function based on a desired waveform after the Fourier transform and then performs an inverse Fourier transform, and performs a replacement to constrain the phase spectrum function after the inverse Fourier transform. The filtering process unit performs a filtering process of cutting a part exceeding a cutoff intensity for each wavelength, on the intensity spectrum function in a frequency domain.
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