- 专利标题: PHOTODIODE DEVICE AND MANUFACTURING METHOD THEREOF
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申请号: US15618748申请日: 2017-06-09
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公开(公告)号: US20180358488A1公开(公告)日: 2018-12-13
- 发明人: YUICHIRO YAMASHITA , HSUEH-LIANG CHOU
- 申请人: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- 主分类号: H01L31/0352
- IPC分类号: H01L31/0352 ; H01L31/02 ; H01L31/0236 ; H01L31/107 ; H01L31/18
摘要:
The present disclosure provides a photodiode device, which includes a semiconductor substrate, a well region in the semiconductor substrate of a first dopant type, a first doped region of the first dopant type in the well region, and a second doped region of a second dopant type disposed in the well region and over the first doped region. The second doped region comprises first recesses exposed through a surface of the second doped region, and a first portion of the second doped region on the surface comprises a first doping concentration of the second dopant type greater than a second doping concentration of a second portion of the second doped region away from the first recesses.
公开/授权文献
- US10205037B2 Photodiode device and manufacturing method thereof 公开/授权日:2019-02-12
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