Invention Application
- Patent Title: METHOD FOR DEPOSITING A CDTE LAYER ON A SUBSTRATE
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Application No.: US16070039Application Date: 2017-02-03
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Publication No.: US20190027634A1Publication Date: 2019-01-24
- Inventor: Henry Morgner , Christoph Metzner , Daniel Hirsch , Olaf Zywitzki , Ludwig Decker , Torsten Werner , Bastian Siepchen , Bettina Späth , Krishnakumar Velappan , Christian Kraft , Christian Drost
- Applicant: Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. , CTF SOLAR GmbH
- Applicant Address: DE Munich DE Dresden
- Assignee: Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V.,CTF SOLAR GmbH
- Current Assignee: Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V.,CTF SOLAR GmbH
- Current Assignee Address: DE Munich DE Dresden
- Priority: DE102016101856.2 20160203
- International Application: PCT/EP2017/052323 WO 20170203
- Main IPC: H01L31/18
- IPC: H01L31/18 ; C23C14/06 ; C23C14/02 ; C23C14/56 ; H01L31/0296 ; H01L31/0445 ; H01L27/146

Abstract:
A method for depositing a CdTe layer on a substrate in a vacuum chamber by means of physical gas phase deposition is provided. The substrate is heated to a coating temperature before the deposition process and then guided past a vessel in which CdTe is converted into a vapour state, a gaseous component with an increased pressure (compared to the vacuum in the vacuum chamber) flowing through at least one inlet, against the substrate surface to be coated, such that the gaseous component is adsorbed on the substrate surface to be coated before the substrate is guided past the at least one vessel.
Public/Granted literature
- US11217720B2 Method for depositing a CdTe layer on a substrate Public/Granted day:2022-01-04
Information query
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