Invention Application
- Patent Title: Radiation Analysis Apparatus
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Application No.: US16041905Application Date: 2018-07-23
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Publication No.: US20190033237A1Publication Date: 2019-01-31
- Inventor: Satoshi Nakayama , Keiichi Tanaka , Atsushi Nagata , Kazuo Chinone
- Applicant: Hitachi High-Tech Science Corporation
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Tech Science Corporation
- Current Assignee: Hitachi High-Tech Science Corporation
- Current Assignee Address: JP Tokyo
- Priority: JP2017-143653 20170725
- Main IPC: G01N23/2252
- IPC: G01N23/2252 ; G01T1/17

Abstract:
A radiation analysis apparatus includes an excitation source unit irradiating an object, for which the radiation analysis apparatus analyzes property or a structure, with a first radiation, a radiation detection unit including three or more radiation detectors that detect a second radiation generated from the object irradiated with the first radiation, a radiation focusing unit disposed between the object and the radiation detection unit, and focusing the second radiation, a position changing unit changing a relative positional relationship between the radiation focusing unit and the radiation detection unit, and a control unit controlling the position changing unit to change the positional relationship, based on first information which is stored in a storage unit and indicates an intensity distribution of the second radiation emitted from the radiation focusing unit and second information indicating a distribution based on a detection count of the second radiation detected by each of the radiation detectors.
Public/Granted literature
- US10908104B2 Radiation analysis apparatus Public/Granted day:2021-02-02
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