Invention Application
- Patent Title: VAPOR DEPOSITION APPARATUS, VAPOR DEPOSITION METHOD, AND METHOD FOR MANUFACTURING ORGANIC EL DISPLAY DEVICE
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Application No.: US16080046Application Date: 2017-03-22
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Publication No.: US20190067579A1Publication Date: 2019-02-28
- Inventor: Satoshi INOUE , Shinichi KAWATO , Yuhki KOBAYASHI
- Applicant: Sharp Kabushiki Kaisha
- Applicant Address: JP Sakai city, Osaka
- Assignee: Sharp Kabushiki Kaisha
- Current Assignee: Sharp Kabushiki Kaisha
- Current Assignee Address: JP Sakai city, Osaka
- Priority: JP2016-066710 20160329
- International Application: PCT/JP2017/011521 WO 20170322
- Main IPC: H01L51/00
- IPC: H01L51/00 ; C23C14/04 ; C23C14/24
Abstract:
Provided is a vapor deposition apparatus capable of suppressing the occurrence of relatively large smudges not intended by design. In this vapor deposition apparatus, a recessed portion is provided in a scanning direction of a substrate in a region between two emission openings adjacent to each other on a limiting plate side of a top plate.
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