Invention Application
- Patent Title: GAS BARRIER FILM, SOLAR CELL, AND MANUFACTURING METHOD OF GAS BARRIER FILM
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Application No.: US16246023Application Date: 2019-01-11
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Publication No.: US20190148575A1Publication Date: 2019-05-16
- Inventor: Eijiro Iwase
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Priority: JP2016-146119 20160726; JP2017-014656 20170130
- Main IPC: H01L31/0392
- IPC: H01L31/0392 ; H01L31/0216 ; B32B27/06 ; B32B27/16 ; B32B27/30 ; C08F290/12 ; C09D133/04 ; C09D175/16 ; H05B33/04

Abstract:
An object of the present invention is to provide a gas barrier film which can prevent the damage of an inorganic layer even in a case where the gas barrier film is used in a product which undergoes a step of applying pressure, heat, and the like, a solar cell using the gas barrier film, and a manufacturing method of the gas barrier film. The object is achieved by a gas barrier film having a support and an inorganic layer and a protective organic layer on one surface of the support, in which the protective organic layer has a polymerized substance of a graft copolymer having an acryl polymer as a main chain and having, as a side chain, at least either an acryloyl group-terminated urethane polymer or an acryloyl group-terminated urethane oligomer, a polymerized substance of a (meth)acrylate monomer having three or more functional groups, a polymerized substance of the graft copolymer and the (meth)acrylate monomer having three or more functional groups, a (meth)acrylate polymer, and a silane coupling agent having a (meth)acryloyl group.
Public/Granted literature
- US10665738B2 Gas barrier film, solar cell, and manufacturing method of gas barrier film Public/Granted day:2020-05-26
Information query
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