Invention Application
- Patent Title: SYSTEM AND METHOD FOR PRODUCING AN OPTICAL MASK FOR SURFACE MICROTEXTURING, AND SURFACE MICROTEXTURING PLANT AND METHOD
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Application No.: US16311293Application Date: 2017-06-21
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Publication No.: US20190187567A1Publication Date: 2019-06-20
- Inventor: Maxime BICHOTTE , Yves JOURLIN , Laurent DUBOST
- Applicant: H.E.F. , UNIVERSITE JEAN MONNET SAINT ETIENNE , CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS)
- Applicant Address: FR Andrezieux Boutheon FR Saint Etienne Cedex 2 FR Paris Cedex 16
- Assignee: H.E.F.,UNIVERSITE JEAN MONNET SAINT ETIENNE,CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS)
- Current Assignee: H.E.F.,UNIVERSITE JEAN MONNET SAINT ETIENNE,CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS)
- Current Assignee Address: FR Andrezieux Boutheon FR Saint Etienne Cedex 2 FR Paris Cedex 16
- Priority: FR1655753 20160621
- International Application: PCT/FR2017/051649 WO 20170621
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03F9/00 ; G03F1/76 ; G03F1/80

Abstract:
The invention relates to a system (2) for producing an optical mask (35) for surface microtexturing, said system (2) comprising: a substrate (10) having a surface (11) that is to be textured; a layer of material (20) which covers the surface (11) of the substrate (10) and has an outer surface (21) that is exposed to the outside environment; and a generating and depositing device for generating and depositing droplets (30) on the outer surface (21) of the layer of material (20), in a specific arrangement (31) under condensation, forming the optical mask (35) on the outer surface (21) of the layer of material (20). The invention also relates to a treatment plant comprising a system (2) of said type. The invention further relates to a method for producing a mask as well as to a surface microtexturing method.
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