- 专利标题： GROUP 4 TRANSITION METAL-CONTAINING FILM FORMING COMPOSITIONS FOR VAPOR DEPOSITION OF GROUP 4 TRANSITION METAL-CONTAINING FILMS
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申请号： US16331204申请日： 2017-04-10
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公开(公告)号： US20190218233A1公开(公告)日： 2019-07-18
- 发明人: Ziyun WANG , Zhiwen WAN , Jean-Marc GIRARD
- 申请人： Ziyun WANG , Zhiwen WAN , Jean-Marc GIRARD , L'Air Liquide, Société Anonyme pour I'Etude et I'Exploitation des Procédés Georges Claude
- 国际申请： PCT/US2017/026817 WO 20170410
- 主分类号： C07F7/28
- IPC分类号： C07F7/28 ; C23C16/455 ; C23C16/18 ; C23C16/40
摘要：
Group 4 transition metal-containing film forming compositions comprising Group 4 transition metal azatrane precursors are disclosed. Also disclosed are methods of synthesizing and using the disclosed precursors to deposit Group 4 transition metal-containing films on one or more substrates via vapor deposition processes.
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