Invention Application
- Patent Title: SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
-
Application No.: US16247631Application Date: 2019-01-15
-
Publication No.: US20190229192A1Publication Date: 2019-07-25
- Inventor: Hiroki KOMAGATA , Naoki OKUNO , Yutaka OKAZAKI , Hiroshi FUJIKI
- Applicant: Semiconductor Energy Laboratory Co., Ltd.
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Priority: JP2018-006870 20180119
- Main IPC: H01L29/20
- IPC: H01L29/20 ; H01L29/10 ; H01L29/221 ; H01L29/423 ; H01L29/786

Abstract:
A semiconductor device with a high on-state current is provided. The semiconductor device includes a first insulator over a substrate, an oxide over the first insulator, a second insulator over the oxide, a conductor overlapping with the oxide with the second insulator therebetween, a third insulator in contact with a top surface of the oxide, a fourth insulator in contact with a top surface of the third insulator, a side surface of the second insulator, and a side surface of the conductor, and a fifth insulator in contact with a side surface of the fourth insulator, a side surface of the third insulator, and the top surface of the oxide. The third insulator has a lower oxygen permeability than the fourth insulator.
Public/Granted literature
- US10734487B2 Semiconductor device and method for manufacturing semiconductor device Public/Granted day:2020-08-04
Information query
IPC分类: