发明申请
- 专利标题: GENERATING A HIGH-RESOLUTION LITHOLOGY MODEL FOR SUBSURFACE FORMATION EVALUATION
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申请号: US15883817申请日: 2018-01-30
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公开(公告)号: US20190235109A1公开(公告)日: 2019-08-01
- 发明人: Hao Zhang , Alberto Mezzatesta
- 申请人: Hao Zhang , Alberto Mezzatesta
- 申请人地址: US TX Houston
- 专利权人: Baker Hughes, a GE company, LLC
- 当前专利权人: Baker Hughes, a GE company, LLC
- 当前专利权人地址: US TX Houston
- 主分类号: G01V1/30
- IPC分类号: G01V1/30 ; E21B7/06 ; G01V1/50 ; C09K8/62 ; E21B49/00 ; G01V1/28 ; G01V5/10 ; G01V3/08 ; G01V99/00
摘要:
Examples of techniques for generating a high-resolution lithology model for subsurface formation evaluation are disclosed. In one example implementation according to aspects of the present disclosure, a computer-implemented method includes determining, by a processing device, a low-resolution lithology volumetric model. The method further includes comparing, by the processing device, the low-resolution lithology volumetric model to a high-resolution imaging log. The method further includes calculating, by the processing device, a dynamic boundary curve for each of a plurality of moving windows. The method further includes generating, by the processing device, the high-resolution lithology model based at least in part on the calculated dynamic boundary curve for each of the plurality of moving windows. The method further includes controlling a drilling operation based at least in part on the high-resolution lithology model.