Invention Application
- Patent Title: LIGAND-CAPPED MAIN GROUP NANOPARTICLES AS HIGH ABSORPTION EXTREME ULTRAVIOLET LITHOGRAPHY RESISTS
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Application No.: US16316594Application Date: 2016-09-30
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Publication No.: US20190302615A1Publication Date: 2019-10-03
- Inventor: Marie KRYSAK , James M. BLACKWELL , Robert L. BRISTOL , Florian GSTREIN
- Applicant: Intel Corporation
- International Application: PCT/US2016/054953 WO 20160930
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/20
Abstract:
A photosensitive composition including metal nanoparticles capped with an organic ligand, wherein the metal particles includes a metal that absorbs light in the extreme ultraviolet spectrum. A method including synthesizing metal particles including a diameter of 5 nanometers or less, wherein the metal particles includes a metal that absorbs light in the extreme ultraviolet spectrum; and capping the metal particles with an organic ligand. A method including depositing a photosensitive composition on a semiconductor substrate, wherein the photosensitive composition includes metal nanoparticles capped with an organic ligand and the nanoparticles include a metal that absorbs light in the extreme ultraviolet spectrum; exposing the photosensitive composition to light in an ultraviolet spectrum through a mask including a pattern; and transferring the mask pattern to the photosensitive composition.
Public/Granted literature
- US11320734B2 Ligand-capped main group nanoparticles as high absorption extreme ultraviolet lithography resists Public/Granted day:2022-05-03
Information query
IPC分类:
