- 专利标题： LITHOGRAPHY OPTICS ADJUSTMENT AND MONITORING
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申请号： US16439893申请日： 2019-06-13
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公开(公告)号： US20190310558A1公开(公告)日： 2019-10-10
- 发明人: Thomas Frederick Allen Bibby, JR. , Omar Zurita , Abhishek Subramanian , Thomas Patrick Duffey
- 申请人： Cymer, LLC
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; G01J1/42
摘要：
Methods and apparatus for processing an image of a beam generated by an optical system to extract information indicative of an extent of damage to optical elements in the optical system. Also disclosed is a beam image and analysis tool capable of acquiring an image of a beam at any one of a number of locations.
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