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31 条记录 (耗时 0.018 秒)

    SPECTRAL FEATURE SELECTION AND PULSE TIMING CONTROL OF A PULSED LIGHT BEAM
    1.
    发明申请
    SPECTRAL FEATURE SELECTION AND PULSE TIMING CONTROL OF A PULSED LIGHT BEAM 有权

    公开(公告)号：US20230040812A1

    公开(公告)日：2023-02-09

    申请号：US17971103

    申请日：2022-10-21

    申请人： Cymer, LLC

    发明人： Kevin Michael O'Brien ,  Thomas Patrick Duffey ,  Joshua Jon Thornes

    IPC分类号： G03F7/20 ,  H01S3/07 ,  H01S3/08 ,  H01S3/11 ,  H01S3/13 ,  H01S3/137 ,  H01S3/23

    摘要： A method includes driving, while producing a burst of pulses at a pulse repetition rate, a spectral feature adjuster among a set of discrete states at a frequency correlated with the pulse repetition rate; and in between the production of the bursts of pulses (while no pulses are being produced), driving the spectral feature adjuster according to a driving signal defined by a set of parameters. Each discrete state corresponds to a discrete value of a spectral feature. The method includes ensuring that the spectral feature adjuster is in one of the discrete states that corresponds to a discrete value of the spectral feature of the amplified light beam when a pulse in the next burst is produced by adjusting one or more of: an instruction to the lithography exposure apparatus, the driving signal to the spectral feature adjuster, and/or the instruction to the optical source.

    Spectral feature selection and pulse timing control of a pulsed light beam
    3.
    发明授权
    Spectral feature selection and pulse timing control of a pulsed light beam 有权

    公开(公告)号：US11526083B2

    公开(公告)日：2022-12-13

    申请号：US16980467

    申请日：2019-03-01

    申请人： Cymer, LLC

    发明人： Kevin Michael O'Brien ,  Thomas Patrick Duffey ,  Joshua Jon Thornes

    IPC分类号： G03F7/20 ,  H01S3/07 ,  H01S3/08 ,  H01S3/11 ,  H01S3/13 ,  H01S3/137 ,  H01S3/23

    摘要： A method includes driving, while producing a burst of pulses at a pulse repetition rate, a spectral feature adjuster among a set of discrete states at a frequency correlated with the pulse repetition rate; and in between the production of the bursts of pulses (while no pulses are being produced), driving the spectral feature adjuster according to a driving signal defined by a set of parameters. Each discrete state corresponds to a discrete value of a spectral feature. The method includes ensuring that the spectral feature adjuster is in one of the discrete states that corresponds to a discrete value of the spectral feature of the amplified light beam when a pulse in the next burst is produced by adjusting one or more of: an instruction to the lithography exposure apparatus, the driving signal to the spectral feature adjuster, and/or the instruction to the optical source.

    DUAL PULSED POWER SYSTEM WITH INDEPENDENT VOLTAGE AND TIMING CONTROL AND REDUCED POWER CONSUMPTION
    7.
    发明申请
    DUAL PULSED POWER SYSTEM WITH INDEPENDENT VOLTAGE AND TIMING CONTROL AND REDUCED POWER CONSUMPTION 有权

    公开(公告)号：US20230017337A1

    公开(公告)日：2023-01-19

    申请号：US17788370

    申请日：2020-12-11

    申请人： Cymer, LLC

    发明人： Paul Christopher Melcher ,  Thomas Patrick Duffey ,  Walter Dale Gillespie

    IPC分类号： H01S3/097 ,  H01S3/23 ,  H01S3/104 ,  H01S3/10

    摘要： Systems, apparatuses, methods, and computer program products are provided for controlling a laser source that includes two laser discharge chambers. An example laser control system can include a first pulsed powertrain including a first independent circuit configured to generate a first resonant charging supply (RCS) output voltage. The first RCS output voltage can be configured to drive a first laser discharge chamber. The example laser control system can further include a second pulsed powertrain including a second independent circuit configured to generate a second RCS output voltage independent from the first RCS output voltage. The second RCS output voltage can be configured to drive a second laser discharge chamber independent from the first laser discharge chamber.

    RADIATION SOURCE TESTING
    8.
    发明申请
    RADIATION SOURCE TESTING 有权

    公开(公告)号：US20220404717A1

    公开(公告)日：2022-12-22

    申请号：US17772207

    申请日：2020-10-16

    申请人： Cymer, LLC

    发明人： Russell Allen Burdt ,  Thomas Patrick Duffey

    IPC分类号： G03F7/20

    摘要： A method of generating a test for a radiation source for a lithographic apparatus comprises a step of receiving data corresponding to a plurality of firing patterns of the radiation source. The method further comprises the step of analyzing the data to determine parameters for configuring one or more further firing patterns for testing the radiation source. The parameters are determined such that a stability of the radiation source when executing the one or more further firing patterns configured using the parameters is substantially the same as, or within predefined bounds relative to, a stability of the radiation source when executing the plurality of firing patterns. Furthermore, parameters are determined such that a total duration of the one or more further firing patterns when executed by the radiation source will be less than a duration of the plurality of firing patterns when executed by the radiation source.

    CONTROL SYSTEM FOR A PLURALITY OF DEEP ULTRAVIOLET OPTICAL OSCILLATORS
    9.
    发明申请
    CONTROL SYSTEM FOR A PLURALITY OF DEEP ULTRAVIOLET OPTICAL OSCILLATORS 有权

    公开(公告)号：US20220255286A1

    公开(公告)日：2022-08-11

    申请号：US17612113

    申请日：2020-05-15

    申请人： Cymer, LLC

    发明人： Yingbo Zhao ,  Walter Dale Gillespie ,  Joshua Jon Thornes ,  Thomas Patrick Duffey ,  Eric Anders Mason

    IPC分类号： H01S3/13 ,  H01S3/23 ,  H01S3/036 ,  G03F7/20

    摘要： A deep ultraviolet (DUV) optical system includes: an optical source system including: a plurality of optical oscillators; a beam combiner; and a beam control apparatus between the optical oscillators and the beam combiner. The beam combiner is configured to receive and direct light emitted from any of the optical oscillators toward a scanner apparatus as an exposure light beam, and the beam control apparatus is configured to determine whether the beam combiner receives light from a particular one of the optical oscillators. The DUV optical lithography system also includes a control system coupled to the optical source system, the control system configured to: determine whether a condition exists in the DUV optical system, and based on a determination that the condition exists, perform a calibration action in a subset of the optical oscillators.