Invention Application
- Patent Title: CHEMICAL VAPOR DEPOSITION APPARATUS WITH MULTI-ZONE INJECTION BLOCK
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Application No.: US16383321Application Date: 2019-04-12
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Publication No.: US20190316258A1Publication Date: 2019-10-17
- Inventor: Bojan Mitrovic , Ian Kunsch , Juan Gamarra , Mandar Deshpande
- Applicant: Veeco Instruments Inc.
- Main IPC: C23C16/54
- IPC: C23C16/54 ; C23C16/455

Abstract:
An injector block for supplying one or more reactant gases into a chemical vapor deposition reactor. The injector block including a plurality of first reactant gas distribution channels between one or more first reactant gas inlets and a plurality of first reactant gas distribution outlets to deliver a first reactant gas into the reactor, and a plurality of second reactant gas distribution channels between one or more second reactant gas inlets and a plurality of second reactant gas distribution outlets to deliver a second reactant gas into the reactor, the plurality of second reactant gas distribution outlets partitioned into at least a second reactant gas first zone and a second reactant gas second zone, the second reactant gas second zone at least partially surrounding the second reactant gas first zone.
Information query
IPC分类: