Invention Application
- Patent Title: Detecting Deviations Between Event Log and Process Model
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Application No.: US16563070Application Date: 2019-09-06
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Publication No.: US20190392334A1Publication Date: 2019-12-26
- Inventor: JING LI , XIANG LI , HAIFENG LIU , GUO TONG XIE , YI QIN YU , SHI LEI ZHANG
- Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Priority: CN201410038281.X 20140126
- Main IPC: G06N7/00
- IPC: G06N7/00

Abstract:
A method for detecting deviations between an event log and a process model includes converting the process model into a probability process model, the probability process model comprising multiple nodes in multiple hierarchies and probability distribution associated with the multiple nodes, a leaf node among the multiple nodes corresponding to an activity in the process model; detecting differences between at least one event sequence contained in the event log and the probability process model according to a correspondence relationship; and identifying the differences as the deviations in response to the differences exceeding a predefined threshold; wherein the correspondence relationship describes a correspondence relationship between an event in one event sequence of the at least one event sequence and a leaf node in the probability process model.
Public/Granted literature
- US11514348B2 Detecting deviations between event log and process model Public/Granted day:2022-11-29
Information query
IPC分类:
G | 物理 |
G06 | 计算;推算或计数 |
G06N | 基于特定计算模型的计算机系统 |
G06N7/00 | 基于特定数学模式的计算机系统 |