Invention Application
- Patent Title: Remote Hydrogen Plasma Titanium Deposition to Enhance Selectivity and Film Uniformity
-
Application No.: US16572553Application Date: 2019-09-16
-
Publication No.: US20200013627A1Publication Date: 2020-01-09
- Inventor: Takashi Kuratomi , Avgerinos V. Gelatos , I-Cheng Chen , Faruk Gungor
- Applicant: Applied Materials, Inc.
- Main IPC: H01L21/285
- IPC: H01L21/285 ; C23C16/06 ; C23C16/455 ; C23C16/50 ; C23C16/04 ; C23C16/14 ; C23C16/452 ; H01L21/3205 ; H01J37/00
Abstract:
Methods and apparatus to selectively deposit metal films (e.g., titanium films) are described. One of the precursors is energized to form ions and radicals of the precursor. The precursors flow through separate channels of a dual channel gas distribution assembly to react in a processing region above a substrate.
Public/Granted literature
- US10770300B2 Remote hydrogen plasma titanium deposition to enhance selectivity and film uniformity Public/Granted day:2020-09-08
Information query
IPC分类:
