Invention Application
- Patent Title: POLYMER, ORGANIC LAYER COMPOSITION AND METHOD OF FORMING PATTERNS
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Application No.: US16509804Application Date: 2019-07-12
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Publication No.: US20200024384A1Publication Date: 2020-01-23
- Inventor: Sunghwan KIM , Yushin PARK , Hyeonil JUNG
- Applicant: SAMSUNG SDI CO., LTD.
- Priority: KR10-2018-0083636 20180718
- Main IPC: C08G8/04
- IPC: C08G8/04 ; C09D161/06 ; G03F7/11

Abstract:
A polymer, an organic layer composition including the polymer, and a method of forming a pattern using the organic layer composition, the polymer including a reaction product of a first compound represented by Chemical Formula 1 and a second compound represented by Chemical Formula 2: (CHO)n1—Ar1—X—Ar2—(CHO)n2 [Chemical Formula 1] wherein, in Chemical Formula 1, X is O, S, or NR, in which R is a hydrogen, or a substituted or unsubstituted C1 to C30 alkyl group, Ar1 and Ar2 are independently a substituted or unsubstituted C6 to C30 aromatic ring group, and n1 and n2 are independently an integer of 1 to 3; Ar3—(OH)m [Chemical Formula 2] wherein, in Chemical Formula 2, Ar3 is a substituted or unsubstituted C10 to C30 fused aromatic ring group in which at least two rings are fused, and m is an integer of 1 to 3.
Public/Granted literature
- US11512162B2 Polymer, organic layer composition and method of forming patterns Public/Granted day:2022-11-29
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