- 专利标题: CYCLOTRON FOR EXTRACTING CHARGED PARTICLES AT VARIOUS ENERGIES
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申请号: US16227698申请日: 2018-12-20
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公开(公告)号: US20200029421A1公开(公告)日: 2020-01-23
- 发明人: Sébastien DE NEUTER , Jean-Michel GEETS , Benoit NACTERGAL , Vincent NUTTENS , Jarno VAN DE WALLE
- 申请人: Ion Beam Applications S.A.
- 申请人地址: BE Louvain-la-Neuve
- 专利权人: Ion Beam Applications S.A.
- 当前专利权人: Ion Beam Applications S.A.
- 当前专利权人地址: BE Louvain-la-Neuve
- 优先权: EP17209226.4 20171221
- 主分类号: H05H13/00
- IPC分类号: H05H13/00
摘要:
A cyclotron for accelerating a beam of charged particles and extracting the beam. The cyclotron includes a vacuum chamber; a target support element sealed and coupled to the vacuum chamber and including a tubular channel leading to a target; first energy specific extraction kit including a first stripper assembly with a stripper located at a first stripping position for stripping charged particles at a first energy and a second energy specific extraction kit for driving modified charged particles of second energy along a second extraction path towards a target holder, wherein the energy specific extraction kit includes: a second stripper assembly with a stripper located at a second stripping position for stripping charged particles at a second energy and an insert for modifying an orientation of the tubular channel to match the second extraction path such that the modified charged particles of second energy intercept the target holder.
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