Invention Application
- Patent Title: Temporal Atomic Layer Deposition Process Chamber
-
Application No.: US16467817Application Date: 2017-12-05
-
Publication No.: US20200032396A1Publication Date: 2020-01-30
- Inventor: Alexander S. Polyak , Joseph Yudovsky
- Applicant: Applied Materials, Inc.
- International Application: PCT/US2017/064598 WO 20171205
- Main IPC: C23C16/455
- IPC: C23C16/455

Abstract:
A dual channel showerhead comprising a first plurality of channels formed in the back surface of the showerhead and extending from a first end to a second end, a second plurality of channels formed through the thickness of the showerhead and extending from a first end to a second end, a first end plenum in fluid connection with the second plurality of channels at the first end and a second end plenum in fluid connection with the second plurality of channels at the second end. Processing chambers including the dual channel showerhead and a blocker ring separating the edge ring from the pumping ring are also discussed.
Public/Granted literature
- US10954596B2 Temporal atomic layer deposition process chamber Public/Granted day:2021-03-23
Information query
IPC分类: