- 专利标题: TRANSITION METAL DOPED GERMANIUM-ANTIMONY-TELLURIUM (GST) MEMORY DEVICE COMPONENTS AND COMPOSITION
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申请号: US16529573申请日: 2019-08-01
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公开(公告)号: US20200066986A1公开(公告)日: 2020-02-27
- 发明人: Paolo Fantini , Marco Bernasconi , Silvia Gabardi
- 申请人: Micron Technology, Inc.
- 主分类号: H01L45/00
- IPC分类号: H01L45/00 ; G11C13/00 ; G11C8/14 ; G11C7/18
摘要:
Methods, systems, and devices for operating memory cell(s) using transition metal doped GST are described. As discussed herein, a composition including germanium (Ge), antimony (Sb), tellurium (Te), and at least one of yttrium (Y) and scandium (Sc) may be used as a memory element in a memory cell. For example, a memory element may include a composition having Ge in an amount ranging from 15 to 35 atomic percent (at. %) of the composition, Sb in an amount less than or equal to 50 at. % of the composition, Te in an amount greater than or equal to 40 at. % of the composition, and at least one of Y and Sc in an amount ranging from 0.15 to 10 at. % of the composition.
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