- 专利标题： METHODS OF DETERMINING SCATTERING OF RADIATION BY STRUCTURES OF FINITE THICKNESSES ON A PATTERNING DEVICE
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申请号： US16467124申请日： 2017-12-06
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公开(公告)号： US20200073260A1公开(公告)日： 2020-03-05
- 发明人: Yu CAO , Yen-Wen LU , Peng LIU , Rafael C. HOWELL
- 申请人： ASML NETHERLANDS B.V.
- 申请人地址： NL Veldhoven
- 专利权人： ASML NETHERLANDS B.V.
- 当前专利权人： ASML NETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven
- 国际申请： PCT/EP2017/081744 WO 20171206
- 主分类号： G03F7/20
- IPC分类号： G03F7/20
摘要：
A method including: obtaining a thin-mask transmission function of a patterning device and a M3D model for a lithographic process, wherein the thin-mask transmission function represents a continuous transmission mask and the M3D model at least represents a portion of M3D attributable to multiple edges of structures on the patterning device; determining a M3D mask transmission function of the patterning device by using the thin-mask transmission function and the M3D model; and determining an aerial image produced by the patterning device and the lithographic process, by using the M3D mask transmission function.
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