Invention Application
- Patent Title: RF ANTENNA PRODUCING A UNIFORM NEAR-FIELD POYNTING VECTOR
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Application No.: US16512285Application Date: 2019-07-15
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Publication No.: US20200118792A1Publication Date: 2020-04-16
- Inventor: Hema Swaroop Mopidevi , Lee Chen , Thomas W. Anderson
- Applicant: Lam Research Corporation
- Main IPC: H01J37/32
- IPC: H01J37/32 ; H01L21/683 ; H01L21/67

Abstract:
An apparatus for generating plasma, including a quadrupole antenna having a center region and an outer region and configured to be disposed over a dielectric window of a plasma chamber. The quadrupole antenna including a first coil defining a first SDA and a second coil defining a second SDA, the first coil being in a nested arrangement within the second coil. The nested arrangement places a turn of the first coil to be adjacent to a corresponding turn of the second coil as the first and second coils spiral from the center region to the outer region of the quadrupole antenna. Adjacent turns of each of the first and second coils are horizontally separated from one another by a distance when disposed over the dielectric window.
Public/Granted literature
- US10685810B2 RF antenna producing a uniform near-field Poynting vector Public/Granted day:2020-06-16
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