Invention Application
- Patent Title: Fabric Substrate and Manufacturing Method Thereof
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Application No.: US16683714Application Date: 2019-11-14
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Publication No.: US20200149217A1Publication Date: 2020-05-14
- Inventor: Kyung Cheol Choi , Seung Yeop Choi , Seon Il Kwon
- Applicant: Korea Advanced Institute of Science and Technology
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@4a1e3db com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@3c0280e1
- Main IPC: D06N3/18
- IPC: D06N3/18 ; B08B3/04 ; D06N3/00 ; G09F21/02 ; D06N3/14 ; D06N3/12 ; D06N3/04
Abstract:
According to the present invention, there is provided a fabric substrate for mounting a light emitting element. The fabric substrate includes a fabric layer including at least one fabric, a stress buffer layer that is disposed on the fabric layer and minimizes an occurrence of physical strain and stress caused by bending the fabric layer, and a flattening layer that is disposed on the stress buffer layer and provides a flat surface to allow a light emitting element to operate.
Information query
