Invention Application
- Patent Title: SYSTEM AND METHOD FOR DETECTING ETCH DEPTH OF ANGLED SURFACE RELIEF GRATINGS
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Application No.: US16240301Application Date: 2019-01-04
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Publication No.: US20200158495A1Publication Date: 2020-05-21
- Inventor: Joseph C. Olson , Ludovic Godet , Rutger Meyer Timmerman Thijssen , Morgan Evans
- Applicant: APPLIED Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED Materials, Inc.
- Current Assignee: APPLIED Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Main IPC: G01B11/22
- IPC: G01B11/22 ; G02B5/18 ; C03C15/00

Abstract:
Optical grating components and methods of forming are provided. In some embodiments, a method includes providing an optical grating layer, and forming an optical grating in the optical grating layer, wherein the optical grating comprises a plurality of angled trenches disposed at a non-zero angle of inclination with respect to a perpendicular to a plane of the optical grating layer. The method may further include delivering light from a light source into the optical grating layer, and measuring at least one of: an undiffracted portion of the light exiting the optical grating layer, and a diffracted portion of the light exiting the optical grating layer.
Public/Granted literature
- US10775158B2 System and method for detecting etch depth of angled surface relief gratings Public/Granted day:2020-09-15
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