• Patent Title: RADIO WAVE ABSORBER AND MANUFACTURING METHOD OF RADIO WAVE ABSORBER
  • Application No.: US16578527
    Application Date: 2019-09-23
  • Publication No.: US20200169000A1
    Publication Date: 2020-05-28
  • Inventor: Tatsuo MIKAMI
  • Applicant: FUJIFILM Corporation
  • Applicant Address: JP Tokyo
  • Assignee: FUJIFILM Corporation
  • Current Assignee: FUJIFILM Corporation
  • Current Assignee Address: JP Tokyo
  • Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@826526d
  • Main IPC: H01Q17/00
  • IPC: H01Q17/00
RADIO WAVE ABSORBER AND MANUFACTURING METHOD OF RADIO WAVE ABSORBER
Abstract:
A radio wave absorber including: a support; and a linear absorber that is disposed on at least one surface of the support, has an occupancy per unit volume on the support of 0.05 to 0.70, includes a radio wave absorption material and a binder, and has a maximum length on a cross section perpendicular to a longitudinal direction of 25% or less of a wavelength of the radio wave, and a manufacturing method thereof.
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