Invention Application
- Patent Title: SUBSTRATE MANUFACTURING METHOD
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Application No.: US16640963Application Date: 2018-06-27
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Publication No.: US20200180082A1Publication Date: 2020-06-11
- Inventor: Atsushi TANAKA , Daisuke KAWAGUCHI
- Applicant: National University Corporation Nagoya University , HAMAMATSU PHOTONICS K.K.
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@ee6e321
- International Application: PCT/JP2018/024353 WO 20180627
- Main IPC: B23K26/53
- IPC: B23K26/53 ; B28D5/00

Abstract:
A technique related to a substrate manufacturing method is provided. The substrate manufacturing method comprises irradiating laser into an ingot of gallium nitride (GaN) along a direction substantially vertical to a surface of the ingot and forming a reformed layer in which gallium has precipitated and that is substantially parallel to the ingot surface. The substrate manufacturing method comprises separating the ingot into a plurality with a position where the reformed layer has been formed as a boundary by dissolving the reformed layer.
Information query
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