Invention Application
- Patent Title: A SUBSTRATE HOLDER, A LITHOGRAPHIC APPARATUS AND METHOD OF MANUFACTURING DEVICES
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Application No.: US15779804Application Date: 2016-11-02
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Publication No.: US20200183287A1Publication Date: 2020-06-11
- Inventor: Günes NAKIBOGLU , Coen Hubertus Matheus BALTIS , Siegfried Alexander TROMP , Yuri Johannes Gabriël VAN DE VIJVER , Bert Dirk SCHOLTEN , Daan Daniel Johannes Antonius VAN SOMMEREN , Mark Johannes Hermanus FRENCKEN
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@3f257a19
- International Application: PCT/EP2016/076357 WO 20161102
- Main IPC: G03F7/20
- IPC: G03F7/20 ; H01L21/687 ; H01L21/027
Abstract:
A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder including a main body having a main body surface; a plurality of burls projecting from the main body surface to support the substrate spaced apart from the main body surface; and a liquid control structure provided in a peripheral region of the main body surface and configured to cause liquid to preferentially flow toward the periphery of the main body surface.
Public/Granted literature
- US10895808B2 Substrate holder, a lithographic apparatus and method of manufacturing devices Public/Granted day:2021-01-19
Information query
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