公开(公告)号：US20170045828A1

公开(公告)日：2017-02-16

申请号：US15306676

申请日：2015-03-25

Applicant: ASML Netherlands B.V.

Inventor： Daan Daniel Johannes Antonius VAN SOMMEREN ,  Thomas POIESZ

IPC: G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70866 ,  H01L21/67028 ,  H01L21/67051 ,  H01L21/6875

Abstract: A support table (WT) for a lithographic apparatus, the support table is configured to support a lower surface of a substrate (W). The support table comprises: a base surface (22) configured to be substantially parallel to the lower surface of the substrate supported on the support table, a plurality of burls (20) protruding above the base surface, each of the plurality of burls having a respective distal end and a first height above the base surface, the plurality of burls arranged such that, when the substrate is supported by the support table, the substrate is supported by the respective distal end of each of the plurality of the burls, and a plurality of elongate raised protrusions (45) protruding above the base surface, each of the elongate raised protrusions having a second height above the base surface, wherein the second height is less than the first height. The base surface comprises a plurality of regions within each of which some of the elongate raised protrusions are located. All of the elongate raised protrusions located within each region have substantially the same direction of elongation such that they are substantially parallel to each other so as to form between the elongate raised protrusions at least one gas flow path substantially parallel to the elongate raised protrusions.

Abstract translation: 一种用于光刻设备的支撑台（WT），所述支撑台被配置为支撑衬底（W）的下表面。 所述支撑台包括：基部表面（22），其被构造成基本上平行于支撑在所述支撑台上的所述基板的下表面;多个凸起（20），突出在所述基座表面上方，所述多个毛刺中的每一个具有 相应的远端和在基底表面上方的第一高度，所述多个毛刺被布置成使得当基底被支撑台支撑时，基底由多个毛刺中的每一个的相应远端支撑，并且 多个在基座表面上突出的细长凸起突起（45），每个细长凸起突起在基面上方具有第二高度，其中第二高度小于第一高度。 基部表面包括多个区域，每个区域中的一些细长凸起突起位于其中。 位于每个区域内的所有细长凸起突起具有基本上相同的伸长方向，使得它们彼此基本平行，从而在细长凸起之间形成基本上平行于细长凸起突起的至少一个气流路径。

公开(公告)号：US20190265597A1

公开(公告)日：2019-08-29

申请号：US16407878

申请日：2019-05-09

Applicant: ASML NETHERLANDS B.V.

Inventor： Daan Daniel Johannes Antonius VAN SOMMEREN ,  Coen Hubertus Matheus BALTIS ,  Harold Sebastiaan BUDDENBERG ,  Giovanni Luca GATTOBIGIO ,  Johannes Cornelis Paulus MELMAN ,  Günes NAKIBOGLU ,  Theodorus Wilhelmus POLET ,  Walter Theodorus Matheus STALS ,  Yuri Johannes Gabriël VAN DE VIJVER ,  Josephus Peter VAN LIESHOUT ,  Jorge Alberto VIEYRA SALAS ,  Aleksandar Nikolov ZDRAVKOV

IPC: G03F7/20

Abstract: A substrate table configured to support a substrate for exposure in an immersion lithographic apparatus, the substrate table including: a support body having a support surface configured to support the substrate; and a cover ring fixed relative to the support body and configured to surround, in plan view, the substrate supported on the support surface, wherein the cover ring has an upper surface and at least a portion of the upper surface is configured so as to alter the stability of a meniscus of immersion liquid when moving along the upper surface towards the substrate.

公开(公告)号：US20180181004A1

公开(公告)日：2018-06-28

申请号：US15738701

申请日：2016-06-16

Applicant: ASML Netherlands B.V.

Inventor： Seerwan SAEED ,  Petrus Martinus Gerardus Johannes ARTS ,  Harold Sebastiaan BUDDENBERG ,  Erik Henricus Egidius Catharina EUMMELEN ,  Giovanni Luca GATTOBIGIO ,  Floor Lodewijk KEUKENS ,  Ferdy MIGCHELBRINK ,  Jeroen Arnoldus Leonardus Johanne RAAYMAKERS ,  Arnoldus Johannes Martinus Jozeph RAS ,  Gheorghe TANASA ,  Jimmy Matheus Wilhelmus VAN DE WINKEL ,  Daan Daniel Johannes Antonius VAN SOMMEREN ,  Marijn WOUTERS ,  Miao YU

IPC: G03F7/20 ,  G01N21/95

CPC classification number: G03F7/7085 ,  G01N21/9515 ,  G03F7/70341 ,  G03F7/7065 ,  G03F7/70916 ,  H01L22/12 ,  H01L27/14627 ,  H01L27/14678 ,  H01L27/14862

Abstract: An inspection substrate for inspecting a component, e.g. a liquid confinement system, of an apparatus for processing production substrates, e.g. a lithographic apparatus, the inspection substrate comprising: a body having dimensions similar to a production substrate so that the inspection substrate is compatible with the apparatus; an illumination device, e.g. light emitting diodes, embedded in the body; a sensor, e.g. an imaging device or a pressure sensor, for generating inspection information relating to a parameter of a component of the apparatus proximate to the inspection substrate, the sensor embedded in the body; and a storage device embedded in the body, the storage device configured to store the inspection information, e.g. image data.

公开(公告)号：US20200183287A1

公开(公告)日：2020-06-11

申请号：US15779804

申请日：2016-11-02

Applicant: ASML NETHERLANDS B.V.

Inventor： Günes NAKIBOGLU ,  Coen Hubertus Matheus BALTIS ,  Siegfried Alexander TROMP ,  Yuri Johannes Gabriël VAN DE VIJVER ,  Bert Dirk SCHOLTEN ,  Daan Daniel Johannes Antonius VAN SOMMEREN ,  Mark Johannes Hermanus FRENCKEN

IPC: G03F7/20 ,  H01L21/687 ,  H01L21/027

Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder including a main body having a main body surface; a plurality of burls projecting from the main body surface to support the substrate spaced apart from the main body surface; and a liquid control structure provided in a peripheral region of the main body surface and configured to cause liquid to preferentially flow toward the periphery of the main body surface.

公开(公告)号：US20200166845A1

公开(公告)日：2020-05-28

申请号：US16061553

申请日：2016-12-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Christianus Wilhelmus Johannes BERENDSEN ,  Günes NAKIBOGLU ,  Daan Daniel Johannes Antonius VAN SOMMEREN ,  Gijsbert RISPENS ,  Johan Franciscus Maria BECKERS ,  Theodorus Johannes Antonius RENCKENS

IPC: G03F7/20 ,  G03F7/16

Abstract: A method of processing a substrate includes: providing a substrate with a layer of photosensitive material on a surface of the substrate; and removing at least part of the photosensitive material from around an outer edge of the layer of photosensitive material so as to generate an edge, having a radial width, around the layer of photosensitive material remaining on the surface of the substrate, wherein the photosensitive material varies in thickness forming a thickness profile across the radial width and the removing is controlled so as to generate variation in the thickness profile along the length of the edge, and/or wherein the removing is controlled so as to generate a rough edge around the layer of photosensitive material remaining on the surface of the substrate.

公开(公告)号：US20180364584A1

公开(公告)日：2018-12-20

申请号：US15781813

申请日：2016-11-02

Applicant: ASML NETHERLANDS B.V.

Inventor： Daan Daniel Johannes Antonius VAN SOMMEREN ,  Coen Hubertus Matheus BALTIS ,  Harold Sebastiaan BUDDENBERG ,  Giovanni Luca GATTOBIGIO ,  Johannes Cornelis Paulus MELMAN ,  Günes NAKIBOGLU ,  Theodorus Wilhelmus POLET ,  Walter Theodorus Matheus STALS ,  Yuri Johannes Gabriël VAN DE VIJVER ,  Josephus Peter VAN LIESHOUT ,  Jorge Alverto VIEYRA SALAS ,  Aleksandar Nikolov ZDRAVKOV

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70716

Abstract: A substrate table configured to support a substrate for exposure in an immersion lithographic apparatus, the substrate table including: a support body having a support surface configured to support the substrate; and a cover ring fixed relative to the support body and configured to surround, in plan view, the substrate supported on the support surface, wherein the cover ring has an upper surface, wherein at least a portion of the upper surface is configured so as to alter the stability of a meniscus of immersion liquid when moving along the upper surface towards the substrate.

公开(公告)号：US20170176867A1

公开(公告)日：2017-06-22

申请号：US15327334

申请日：2015-06-18

Applicant: ASML Netherlands B.V.

Inventor： Daan Daniel Johannes Antonius VAN SOMMEREN ,  Bruno Jean François FRACKOWIAK ,  Arend KOOLMA

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/20 ,  G03F7/2041 ,  H01L21/0274

Abstract: A fluid handling structure, an immersion lithographic apparatus and a device manufacturing method are disclosed. In one arrangement, a fluid handling structure has a fluid extraction conduit with a recovery port configured to receive a used fluid into the conduit. A plurality of flow breakers are provided that each extends across at least a portion of the conduit. The flow breakers are positioned downstream of the recovery port. The flow breakers are arranged so that a common plane cuts through at least a portion of two or more of the flow breakers. The common plane is aligned so as to be perpendicular to the average direction of flow in the conduit at the position of the common plane.