- 专利标题: NITRIDE SEMICONDUCTOR TRANSISTOR DEVICE
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申请号: US16705587申请日: 2019-12-06
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公开(公告)号: US20200185506A1公开(公告)日: 2020-06-11
- 发明人: Riichiro SHIROTA , Shinichiro TAKATANI
- 申请人: Riichiro SHIROTA , Shinichiro TAKATANI
- 优先权: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@1c51a8f8
- 主分类号: H01L29/423
- IPC分类号: H01L29/423 ; H01L29/205 ; H01L29/20 ; H01L29/06 ; H01L29/778 ; H01L29/417
摘要:
A nitride semiconductor transistor device is disclosed. The device includes a first nitride semiconductor layer disposed over a substrate, and a second nitride semiconductor layer with a band gap larger than the first nitride semiconductor disposed over the first nitride semiconductor layer. Over the second nitride semiconductor layer, a first insulating film, a charge-storing gate electrode, a second insulating film, and a second gate electrode are formed in order thereon. A source electrode and a drain electrode are disposed over the second nitride semiconductor layer interposing the charge-storing gate electrode in a plane direction. The device further includes a first gate electrode capacitively coupling with the charge-storing gate electrode with an insulating film therebetween forming a first capacitor, and the charge-storing gate electrode is charged by an electron injection from the first gate electrode through the first capacitor.
公开/授权文献
- US11211464B2 Normally-off nitride semiconductor transistor device 公开/授权日:2021-12-28
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