COMPOSITION FOR PREPARING THICK FILM PHOTOREST, THICK FILM PHOTORESIST, AND PROCESS OF PREPARING THE SAME

Invention Application

US20200209743A1 COMPOSITION FOR PREPARING THICK FILM PHOTOREST, THICK FILM PHOTORESIST, AND PROCESS OF PREPARING THE SAME 审中-公开

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Patent Title: COMPOSITION FOR PREPARING THICK FILM PHOTOREST, THICK FILM PHOTORESIST, AND PROCESS OF PREPARING THE SAME
Application No.: US16236952

Application Date: 2018-12-31
Publication No.: US20200209743A1

Publication Date: 2020-07-02
Inventor: Tomas Marangoni , Mingqi Li , Jong Keun Park , Emad Aqad , Amy M. Kwok
Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC
Main IPC: G03F7/038
IPC: G03F7/038 ; G03F7/004

COMPOSITION FOR PREPARING THICK FILM PHOTOREST, THICK FILM PHOTORESIST, AND PROCESS OF PREPARING THE SAME

Abstract:

A photoresist composition, including a polymer having a C6-30 hydroxyaromatic group, a solvent, and a sulfonium salt having Formula (I): wherein, in Formula (I), R, R1 to R8, X, n, and Rf are the same as described in the specification.

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IPC分类:

G	物理
G03	摄影术；电影术；利用了光波以外其他波的类似技术；电记录术；全息摄影术
G03F	图纹面的照相制版工艺，例如，印刷工艺、半导体器件的加工工艺；其所用材料；其所用原版；其所用专用设备（照相排版装置入B41B；为摄影用的感光材料或处理入G03C；电记录、感光层或处理入G03G）
G03F7/00	图纹面，例如，印刷表面的照相制版如光刻工艺；图纹面照相制版用的材料，如：含光致抗蚀剂的材料；图纹面照相制版的专用设备（用于特殊工艺的光致抗蚀剂结构见相关的位置，例如，B44C，H01L，例如，H01L21/00，H05K）
G03F7/004	.感光材料（G03F7/12，G03F7/14优先）
G03F7/038	..高分子化合物被制备成不溶解的或非均匀可湿的（G03F7/075优先；高分子叠氮化合物入G03F7/012；高分子重氮化合物入G03F7/021）