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    PHOTOACTIVE COMPOUNDS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS
    3.
    发明公开
    PHOTOACTIVE COMPOUNDS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS 审中-公开

    公开(公告)号：US20240027904A1

    公开(公告)日：2024-01-25

    申请号：US18352646

    申请日：2023-07-14

    申请人： ROHM AND HAAS ELECTRONIC MATERIALS LLC

    发明人： Emad Aqad ,  Tomas Marangoni ,  Yinjie Cen ,  Paul J. LaBeaume ,  Mingqi Li ,  James F. Cameron

    IPC分类号： G03F7/004 ,  C07D417/06 ,  C07D275/06

    CPC分类号： G03F7/0045 ,  C07D417/06 ,  C07D275/06

    摘要： A photoactive compound including an organic cation; and an anion represented by Formula (1):




    wherein X is an organic group; Y1 and Y2 are each independently a non-hydrogen substituent; Y1 and Y2 together optionally form a ring; Z2 is hydrogen, halogen, substituted or unsubstituted C1-30 alkyl, substituted or unsubstituted C3-30 cycloalkyl, substituted or unsubstituted C3-30 heterocycloalkyl, substituted or unsubstituted C6-50 aryl, substituted or unsubstituted C7-50 arylalkyl, substituted or unsubstituted C7-50 alkylaryl, substituted or unsubstituted C6-50 aryloxy, substituted or unsubstituted C3-30 heteroaryl, substituted or unsubstituted C4-30 alkylheteroaryl, substituted or unsubstituted C4-30 heteroarylalkyl, or substituted or unsubstituted C3-30 heteroaryloxy; Z2 optionally further comprises one or more divalent linking groups as part of its structure; Z2 and one of Y1 or Y2 together optionally form a ring; X and Z2 together optionally form a ring; and X and one of Y1 or Y2 together optionally form a ring.