- 专利标题： APPARATUS FOR VACUUM PROCESSING OF A SUBSTRATE, SYSTEM FOR THE MANUFACTURE OF DEVICES HAVING ORGANIC MATERIALS, AND METHOD FOR SEALING A PROCESSING VACUUM CHAMBER AND A MAINTENANCE VACUUM CHAMBER FROM EACH OTHER
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申请号： US15759801申请日： 2017-03-17
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公开(公告)号： US20200240008A1公开(公告)日： 2020-07-30
- 发明人: Sebastian Gunther ZANG , Andreas SAUER
- 申请人： Sebastian Gunther ZANG , Andreas SAUER , Applied Materials, Inc.
- 国际申请： PCT/EP2017/056372 WO 20170317
- 主分类号： C23C14/56
- IPC分类号： C23C14/56 ; C23C14/24 ; F16K51/02
摘要：
The present disclosure provides an apparatus for vacuum processing of a substrate. The apparatus includes a processing vacuum chamber, a maintenance vacuum chamber, an opening for transferring at least a portion of a material deposition source between the processing vacuum chamber and the maintenance vacuum chamber, and a magnetic closing arrangement for magnetically closing the opening.
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