发明申请
- 专利标题： EUV PELLICLES
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申请号： US16758250申请日： 2018-11-06
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公开(公告)号： US20200341365A1公开(公告)日： 2020-10-29
- 发明人: Zomer Silvester HOUWELING , Chaitanya Krishna ANDE , Dennis DE GRAAF , Thijs KATER , Michael Alfred Josephus KUIJKEN , Mahdiar VALEFI
- 申请人： ASML NETHERLANDS B.V.
- 申请人地址： NL Veldhoven
- 专利权人： ASML NETHERLANDS B.V.
- 当前专利权人： ASML NETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven
- 优先权： com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@6d0b77de com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@533221c8
- 国际申请： PCT/EP2018/080219 WO 20181106
- 主分类号： G03F1/64
- IPC分类号： G03F1/64 ; G03F1/00
摘要：
A pellicle having a metal oxysilicide layer. A pellicle having a molybdenum layer, a ruthenium layer and a silicon oxynitride layer, wherein the molybdenum layer is disposed between the ruthenium layer and the silicon oxynitride layer. A method of manufacturing a pellicle for a lithographic apparatus, the method including providing a metal oxysilicide layer. A lithographic assembly including a pellicle having a metal oxysilicide layer. The use of a pellicle having a metal oxysilicide layer in a lithographic apparatus.
公开/授权文献
- US11237475B2 EUV pellicles 公开/授权日：2022-02-01
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