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公开(公告)号：US20250013142A1
公开(公告)日：2025-01-09
申请号：US18708573
申请日：2022-11-11
Applicant: ASML NETHERLANDS B.V.
Abstract: A method for forming a pellicle for use in a lithographic apparatus is disclosed. The method includes: providing a porous membrane formed from a first material; applying at least one layer of two-dimensional material to at least one side of the porous membrane; and applying a capping layer to the at least one layer of two-dimensional material on at least one side of the porous membrane such that the at least one layer of two-dimensional material is disposed between the or each capping layer and the porous membrane. The at least one layer of two-dimensional material may act to close the adjacent side of the porous membrane and to form a smoother and flatter exterior surface of the pellicle. Advantageously, this may allow the porous membrane to be protected from etching while reducing EUV flare, regardless of the material used for the capping layer.
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公开(公告)号：US20220276553A1
公开(公告)日：2022-09-01
申请号：US17637891
申请日：2020-08-20
Applicant: ASML NETHERLANDS B.V.
Inventor： Andrey NIKIPELOV , Sander BALTUSSEN , Vadim Yevgenyevich BANINE , Alexandr DOLGOV , DONMEZ NOYAN , Zomer Silvester HOUWELING , Arnoud Willem NOTENBOOM , Marcus Adrianus VAN DE KERKHOF , Ties Wouter VAN DER WOORD , Paul Alexander VERMEULEN , David Ferdinand VLES , Victoria VORONINA , Halil Gökay YEGEN
IPC: G03F1/62 , C01B32/158 , G03F7/20
Abstract: A pellicle membrane for a lithographic apparatus, the membrane including uncapped carbon nanotubes. A method of regenerating a pellicle membrane, the method including decomposing a precursor compound and depositing at least some of the products of decomposition onto the pellicle membrane. A method of reducing the etch rate of a pellicle membrane, the method including providing an electric field in the region of the pellicle membrane to redirect ions from the pellicle, or heating elements to desorb radicals from the pellicle, preferably wherein the pellicle membrane is a carbon nanotube pellicle membrane. An assembly for a lithographic apparatus, the assembly including a biased electrode near or including the pellicle membrane or heating means for the pellicle membrane.
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公开(公告)号：US20240411222A1
公开(公告)日：2024-12-12
申请号：US18699574
申请日：2022-10-07
Applicant: ASML NETHERLANDS B.V.
Inventor： Inci DONMEZ NOYAN , Ties Wouter VAN DER WOORD , Johan REININK , Tim Willem Johan VAN DE GOOR , Alexander Ludwig KLEIN , Zomer Silvester HOUWELING , Paul Alexander VERMEULEN , Adrianus Johannes Maria GIESBERS , Johan Hendrik KLOOTWIJK , Lambertus Idris Johannes Catharina BERGERS
Abstract: A pellicle membrane includes a population of metal silicide crystals in a silicon-based matrix, wherein the pellicle membrane has an emissivity of 0.3 or more. Also a method of manufacturing a pellicle membrane, a pellicle assembly, a lithographic apparatus comprising such a pellicle membrane or pellicle assembly. Also the use of such a pellicle membrane, pellicle assembly, or lithographic apparatus in a lithographic apparatus or method.
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Patent Agency Ranking
公开(公告)号：US20240116760A1
公开(公告)日：2024-04-11
申请号：US18276248
申请日：2022-02-03
Applicant: ASML NETHERLANDS B.V.
Inventor： Paul Alexander VERMEULEN , Zomer Silvester HOUWELING
IPC: C01B32/174 , B01J19/12 , B01J19/24 , G03F1/62 , G03F7/00
CPC classification number: C01B32/174 , B01J19/121 , B01J19/24 , G03F1/62 , G03F7/70983 , B01J2219/0886 , B01J2219/0896 , B01J2219/12 , B82Y30/00 , C01B2202/36
Abstract: A carbon nanotube membrane including carbon nanotubes having a pre-selected bonding configuration or (m, n) chirality, wherein the carbon nanotube membrane has a substantial amount of carbon nanotubes having zigzag (m, 0) chirality and/or armchair (m, m) chirality. An apparatus for the treatment of a carbon-based membrane, a method for treating carbon based membranes, pellicles including carbon based membranes, lithographic apparatuses includes carbon nanotube membranes, as well as the use of carbon nanotube membranes in lithographic apparatuses and methods are also described.
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公开(公告)号：US20200341365A1
公开(公告)日：2020-10-29
申请号：US16758250
申请日：2018-11-06
Applicant: ASML NETHERLANDS B.V.
Inventor： Zomer Silvester HOUWELING , Chaitanya Krishna ANDE , Dennis DE GRAAF , Thijs KATER , Michael Alfred Josephus KUIJKEN , Mahdiar VALEFI
Abstract: A pellicle having a metal oxysilicide layer. A pellicle having a molybdenum layer, a ruthenium layer and a silicon oxynitride layer, wherein the molybdenum layer is disposed between the ruthenium layer and the silicon oxynitride layer. A method of manufacturing a pellicle for a lithographic apparatus, the method including providing a metal oxysilicide layer. A lithographic assembly including a pellicle having a metal oxysilicide layer. The use of a pellicle having a metal oxysilicide layer in a lithographic apparatus.
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公开(公告)号：US20230168577A1
公开(公告)日：2023-06-01
申请号：US17922768
申请日：2021-04-21
Applicant: ASML NETHERLANDS B.V.
Inventor： Zomer Silvester HOUWELING , Volker Dirk HILDENBRAND , Alexander Ludwig KLEIN , Paul Alexander VERMEULEN
CPC classification number: G03F1/64 , G02B5/09 , G02B5/208 , G02B5/0891
Abstract: An optical element for a lithographic apparatus, the optical element including an anchor layer selected to support a top layer having self-terminating growth in an operating lithographic apparatus or plasma containing environment. Also described is a method of manufacturing an optical element, the method including depositing a top layer on anchor layer via exposure to plasma, preferably electromagnetically induced plasma. Lithographic apparatuses including such optical elements are also described.
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公开(公告)号：US20220121110A1
公开(公告)日：2022-04-21
申请号：US17566764
申请日：2021-12-31
Applicant: ASML NETHERLANDS B.V.
Inventor： Zomer Silvester HOUWELING , Chaitanya Krishna ANDE , Dennis DE GRAAF , Thijs KATER , Michael Alfred Josephus KUIJKEN , Mahdiar VALEFI
IPC: G03F1/62
Abstract: A pellicle having a metal oxysilicide layer. A pellicle having a molybdenum layer, a ruthenium layer and a silicon oxynitride layer, wherein the molybdenum layer is disposed between the ruthenium layer and the silicon oxynitride layer. A method of manufacturing a pellicle for a lithographic apparatus, the method including providing a metal oxysilicide layer. A lithographic assembly including a pellicle having a metal oxysilicide layer. The use of a pellicle having a metal oxysilicide layer in a lithographic apparatus.
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公开(公告)号：US20180239240A1
公开(公告)日：2018-08-23
申请号：US15752302
申请日：2016-08-26
Applicant: ASML NETHERLANDS B.V.
Inventor： Zomer Silvester HOUWELING , Eric Willem Felix CASIMIRI , Tamara DRUZHININA , JANSSEN Paul , Michael Alfred Josephus KUIJKEN , Martinus Hendrikus Antonius LEENDERS , Sicco OOSTERHOFF , Mária PÉTER , Willem Joan VAN DER ZANDE , Pieter-Jan VAN ZWOL , Beatrijs Louise Marie-Joseph Katrie VERBRUGGE , Johannes Petrus Martinus Bernardus VERMEULEN , David Ferdinand VLES , Willem-Pieter VOORTHUIJZEN
CPC classification number: G03F1/62 , G03F7/70983
Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method comprising: providing a stack comprising a planar substrate and at least one membrane layer, wherein the planar substrate comprises an inner region and a border region around the inner region; positioning the stack on a support such that the inner region of the planar substrate is exposed; and selectively removing the inner region of the planar substrate using a non-liquid etchant, such that the membrane assembly comprises: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border formed from the border region of the planar substrate.
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