公开(公告)号：US20200341365A1

公开(公告)日：2020-10-29

申请号：US16758250

申请日：2018-11-06

申请人： ASML NETHERLANDS B.V.

发明人： Zomer Silvester HOUWELING ,  Chaitanya Krishna ANDE ,  Dennis DE GRAAF ,  Thijs KATER ,  Michael Alfred Josephus KUIJKEN ,  Mahdiar VALEFI

IPC分类号： G03F1/64 ,  G03F1/00

摘要： A pellicle having a metal oxysilicide layer. A pellicle having a molybdenum layer, a ruthenium layer and a silicon oxynitride layer, wherein the molybdenum layer is disposed between the ruthenium layer and the silicon oxynitride layer. A method of manufacturing a pellicle for a lithographic apparatus, the method including providing a metal oxysilicide layer. A lithographic assembly including a pellicle having a metal oxysilicide layer. The use of a pellicle having a metal oxysilicide layer in a lithographic apparatus.

公开(公告)号：US20220276553A1

公开(公告)日：2022-09-01

申请号：US17637891

申请日：2020-08-20

申请人： ASML NETHERLANDS B.V.

发明人： Andrey NIKIPELOV ,  Sander BALTUSSEN ,  Vadim Yevgenyevich BANINE ,  Alexandr DOLGOV ,  DONMEZ NOYAN ,  Zomer Silvester HOUWELING ,  Arnoud Willem NOTENBOOM ,  Marcus Adrianus VAN DE KERKHOF ,  Ties Wouter VAN DER WOORD ,  Paul Alexander VERMEULEN ,  David Ferdinand VLES ,  Victoria VORONINA ,  Halil Gökay YEGEN

IPC分类号： G03F1/62 ,  C01B32/158 ,  G03F7/20

摘要： A pellicle membrane for a lithographic apparatus, the membrane including uncapped carbon nanotubes. A method of regenerating a pellicle membrane, the method including decomposing a precursor compound and depositing at least some of the products of decomposition onto the pellicle membrane. A method of reducing the etch rate of a pellicle membrane, the method including providing an electric field in the region of the pellicle membrane to redirect ions from the pellicle, or heating elements to desorb radicals from the pellicle, preferably wherein the pellicle membrane is a carbon nanotube pellicle membrane. An assembly for a lithographic apparatus, the assembly including a biased electrode near or including the pellicle membrane or heating means for the pellicle membrane.

公开(公告)号：US20220121110A1

公开(公告)日：2022-04-21

申请号：US17566764

申请日：2021-12-31

申请人： ASML NETHERLANDS B.V.

发明人： Zomer Silvester HOUWELING ,  Chaitanya Krishna ANDE ,  Dennis DE GRAAF ,  Thijs KATER ,  Michael Alfred Josephus KUIJKEN ,  Mahdiar VALEFI

IPC分类号： G03F1/62

摘要： A pellicle having a metal oxysilicide layer. A pellicle having a molybdenum layer, a ruthenium layer and a silicon oxynitride layer, wherein the molybdenum layer is disposed between the ruthenium layer and the silicon oxynitride layer. A method of manufacturing a pellicle for a lithographic apparatus, the method including providing a metal oxysilicide layer. A lithographic assembly including a pellicle having a metal oxysilicide layer. The use of a pellicle having a metal oxysilicide layer in a lithographic apparatus.

公开(公告)号：US20180239240A1

公开(公告)日：2018-08-23

申请号：US15752302

申请日：2016-08-26

申请人： ASML NETHERLANDS B.V.

发明人： Zomer Silvester HOUWELING ,  Eric Willem Felix CASIMIRI ,  Tamara DRUZHININA ,  JANSSEN Paul ,  Michael Alfred Josephus KUIJKEN ,  Martinus Hendrikus Antonius LEENDERS ,  Sicco OOSTERHOFF ,  Mária PÉTER ,  Willem Joan VAN DER ZANDE ,  Pieter-Jan VAN ZWOL ,  Beatrijs Louise Marie-Joseph Katrie VERBRUGGE ,  Johannes Petrus Martinus Bernardus VERMEULEN ,  David Ferdinand VLES ,  Willem-Pieter VOORTHUIJZEN

IPC分类号： G03F1/62 ,  G03F7/20

CPC分类号： G03F1/62 ,  G03F7/70983

摘要： A method for manufacturing a membrane assembly for EUV lithography, the method comprising: providing a stack comprising a planar substrate and at least one membrane layer, wherein the planar substrate comprises an inner region and a border region around the inner region; positioning the stack on a support such that the inner region of the planar substrate is exposed; and selectively removing the inner region of the planar substrate using a non-liquid etchant, such that the membrane assembly comprises: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border formed from the border region of the planar substrate.