Invention Application
- Patent Title: OPTICAL THIN FILM, OPTICAL ELEMENT, AND OPTICAL SYSTEM
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Application No.: US16929100Application Date: 2020-07-14
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Publication No.: US20200348451A1Publication Date: 2020-11-05
- Inventor: Kenichi UMEDA , Seigo NAKAMURA , Tatsuya YOSHIHIRO , Yuichiro ITAI
- Applicant: FUJIFILM CORPORATION
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@45137bbf
- Main IPC: G02B1/115
- IPC: G02B1/115 ; G02B5/28

Abstract:
The optical thin film is provided on a substrate and includes, in order, from the substrate side, an interlayer, a silver-containing metal layer, and a dielectric layer, in which an anchor region including an oxide of an anchor metal is provided in an interface region of the silver-containing metal layer on a side close to the interlayer, a cap region including an oxide of the anchor metal is provided in an interface region of the silver-containing metal layer on a side close to the dielectric layer, a film thickness of the silver-containing metal layer is 6 nm or less, the silver-containing metal layer contains a high standard electrode potential metal, and a peak position of a concentration distribution of the high standard electrode potential metal in a film thickness direction of the silver-containing metal layer is positioned closer to the interlayer than a peak position of a silver concentration distribution.
Public/Granted literature
- US11747520B2 Optical thin film having metal layer containing silver and high standard electrode potential metal Public/Granted day:2023-09-05
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