OPTICAL THIN FILM, OPTICAL ELEMENT, AND OPTICAL SYSTEM

    公开(公告)号:US20200348451A1

    公开(公告)日:2020-11-05

    申请号:US16929100

    申请日:2020-07-14

    Abstract: The optical thin film is provided on a substrate and includes, in order, from the substrate side, an interlayer, a silver-containing metal layer, and a dielectric layer, in which an anchor region including an oxide of an anchor metal is provided in an interface region of the silver-containing metal layer on a side close to the interlayer, a cap region including an oxide of the anchor metal is provided in an interface region of the silver-containing metal layer on a side close to the dielectric layer, a film thickness of the silver-containing metal layer is 6 nm or less, the silver-containing metal layer contains a high standard electrode potential metal, and a peak position of a concentration distribution of the high standard electrode potential metal in a film thickness direction of the silver-containing metal layer is positioned closer to the interlayer than a peak position of a silver concentration distribution.

    ANTIREFLECTION FILM, OPTICAL ELEMENT, AND OPTICAL SYSTEM

    公开(公告)号:US20200209436A1

    公开(公告)日:2020-07-02

    申请号:US16813703

    申请日:2020-03-09

    Abstract: An antireflection film is provided on a substrate and includes an interlayer, a silver-containing metal layer containing silver, and a dielectric layer, which are laminated in this order on a side of a substrate, in which the interlayer is a multilayer film having at least two layers in which a layer of high refractive index having a relatively high refractive index and a layer of lower refractive index having a relatively low refractive index are alternately laminated, the dielectric layer has a surface exposed to air, and the dielectric layer is a multilayer film including a silicon-containing oxide layer, a magnesium fluoride layer, and an adhesion layer provided between the silicon-containing oxide layer and the magnesium fluoride layer and configured to increase adhesiveness between the silicon-containing oxide layer and the magnesium fluoride layer.

    OPTICAL MEMBER
    3.
    发明申请
    OPTICAL MEMBER 审中-公开

    公开(公告)号:US20200016863A1

    公开(公告)日:2020-01-16

    申请号:US16583291

    申请日:2019-09-26

    Abstract: Provided is an optical member which includes: a substrate; and a laminated structure including two or more kinds of layers having different materials which are disposed on the substrate, in which the number of layers constituting the laminated structure is 10 or more, the maximum layer thickness of the layers constituting the laminated structure is 8 nm or less, and the minimum transmittance in a wavelength range of 400 nm to 800 nm or in a wavelength range of 6 μm to 12 μm is 10% or more.

    OPTICAL THIN FILM, OPTICAL ELEMENT, OPTICAL SYSTEM, AND METHOD FOR PRODUCING OPTICAL THIN FILM

    公开(公告)号:US20200033508A1

    公开(公告)日:2020-01-30

    申请号:US16580811

    申请日:2019-09-24

    Abstract: An optical thin film formed by laminating, from the substrate side, an interlayer, a silver-containing metal layer that contains silver, and a dielectric layer, in which an anchor metal diffusion control layer provided between the interlayer and the silver-containing metal layer, an anchor region which includes an oxide of the anchor metal and has a surface energy that is less than the surface energy of the silver-containing metal layer and larger than the surface energy of the anchor metal diffusion control layer is provided between the anchor metal diffusion control layer and the silver-containing metal layer, a cap region which includes an oxide of the anchor metal is provided between the silver-containing metal layer and the dielectric layer, and the total film thickness of the silver-containing metal layer, the anchor region, and the cap region is 6 nm or less.

    METHOD OF MANUFACTURING STRUCTURE
    10.
    发明申请

    公开(公告)号:US20180074230A1

    公开(公告)日:2018-03-15

    申请号:US15787440

    申请日:2017-10-18

    Abstract: Provided is a method of manufacturing a structure having a transparent fine uneven structural body formed by hot water treatment, in which a finer uneven structure is formed. Provided is a method of manufacturing a structure, the method being for manufacturing a structure including a substrate, and a transparent fine uneven structural body which is formed on a surface of the substrate by hot water treatment, including: a first step of forming a precursor film of the transparent fine uneven structural body on the substrate; a second step of forming a fine uneven structure on a surface of the precursor film; and a third step of subjecting, to hot water treatment, the precursor film on which the fine uneven structure is formed to form the transparent fine uneven structural body in which a peak value v0 of space frequency of the unevenness of the fine uneven structure formed in the second step satisfies v

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