- 专利标题: SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE, CURRENT CONTROL DEVICE USING SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE, AND AUTOMATIC TRANSMISSION CONTROL DEVICE USING CURRENT CONTROL DEVICE
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申请号: US16970645申请日: 2019-01-28
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公开(公告)号: US20200381454A1公开(公告)日: 2020-12-03
- 发明人: Shinichirou WADA , Yoichiro KOBAYASHI , Masato KITA
- 申请人: HITACHI AUTOMOTIVE SYSTEMS, LTD.
- 申请人地址: JP Hitachinaka-shi, Ibaraki
- 专利权人: HITACHI AUTMOTIVE SYSTEMS, LTD.
- 当前专利权人: HITACHI AUTMOTIVE SYSTEMS, LTD.
- 当前专利权人地址: JP Hitachinaka-shi, Ibaraki
- 优先权: JP2018-032560 20180226
- 国际申请: PCT/JP2019/002640 WO 20190128
- 主分类号: H01L27/12
- IPC分类号: H01L27/12 ; H03K17/687 ; G05F3/26
摘要:
A semiconductor device obtains high current ratio accuracy by eliminating an influence of plasma charging using a MOS-type transistor in which a channel region is isolated and separated from a semiconductor substrate. In a current mirror circuit in which both of a well of a NMOS-type transistor that generates a bias and a well of a NMOS-type transistor that receives the bias are formed insulated and separated from a semiconductor substrate, a connection circuit is connected between gate electrodes and wells of NMOS-type transistors without through the semiconductor substrate, and the connection circuit makes the gate electrodes and the wells in an electrically short-circuited state during manufacturing of the current mirror circuit, and makes the gate electrodes and the wells in a disconnected state in at least one direction during a mounting operation.
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