Invention Application
- Patent Title: CARBON LAYER COVERED MASK IN 3D APPLICATIONS
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Application No.: US16904396Application Date: 2020-06-17
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Publication No.: US20210017641A1Publication Date: 2021-01-21
- Inventor: Mang-Mang LING , Thomas KWON , Jong Mun KIM , Chentsau Chris YING
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Main IPC: C23C16/04
- IPC: C23C16/04 ; C23C16/26 ; H01L27/11524 ; H01L27/11556 ; H01L27/1157 ; H01L27/11582

Abstract:
Embodiments of the present disclosure generally relate to a method for forming an opening using a mask. In one embodiment, a method includes forming a mask on a feature layer. The method includes forming a first opening in the mask to expose a portion of the feature layer. The method further includes forming a carbon layer on the mask and the exposed portion of the feature layer. The method also includes removing portions of the carbon layer and a portion of the exposed portion of the feature layer in order to form a second opening in the feature layer.
Public/Granted literature
- US11384428B2 Carbon layer covered mask in 3D applications Public/Granted day:2022-07-12
Information query
IPC分类: