Invention Application
- Patent Title: HYDROPHILIC COMPOUND REMOVAL METHOD AND ODOR REMOVAL METHOD
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Application No.: US16966941Application Date: 2019-02-05
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Publication No.: US20210046209A1Publication Date: 2021-02-18
- Inventor: Masayuki TSUJI , Taku YAMANAKA
- Applicant: DAIKIN INDUSTRIES, LTD.
- Applicant Address: JP Osaka-shi, Osaka
- Assignee: DAIKIN INDUSTRIES, LTD.
- Current Assignee: DAIKIN INDUSTRIES, LTD.
- Current Assignee Address: JP Osaka-shi, Osaka
- Priority: JP2018-020456 20180207
- International Application: PCT/JP2019/003935 WO 20190205
- Main IPC: A61L9/18
- IPC: A61L9/18 ; C08J3/28
Abstract:
The disclosure provides a method for removing a C4-C20 hydrophilic compound. The method for removing a hydrophilic compound includes step (a) of exposing a composition containing a C4-C20 hydrophilic compound to 0.1 to 500 kGy of radiation to remove the hydrophilic compound.
Information query
