- 专利标题: METHODS OF SUPPORTING A GRAPHENE SHEET DISPOSED ON A FRAME SUPPORT
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申请号: US16987173申请日: 2020-08-06
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公开(公告)号: US20210047740A1公开(公告)日: 2021-02-18
- 发明人: Bong-Gyoon Han , Robert M. Glaeser
- 申请人: Bong-Gyoon Han , Robert M. Glaeser
- 申请人地址: US CA Castro Valley; US CA Berkeley
- 专利权人: Bong-Gyoon Han,Robert M. Glaeser
- 当前专利权人: Bong-Gyoon Han,Robert M. Glaeser
- 当前专利权人地址: US CA Castro Valley; US CA Berkeley
- 主分类号: C23F1/18
- IPC分类号: C23F1/18 ; H01J37/20 ; C01B32/194 ; C23F1/08
摘要:
This disclosure provides systems, methods, and apparatus related to graphene. In one aspect, a method includes submerging a frame support in an etching solution that is contained in a container. A growth substrate, a graphene sheet disposed on the growth substrate, and a primary support disposed on the graphene sheet is placed on a surface of the etching solution. The growth substrate is dissolved in the etching solution to leave the graphene sheet and the primary support floating on a surface of the etching solution. The etching solution in the container is replaced with a washing solution. The washing solution is removed from the container so that the graphene sheet becomes disposed on the frame support.
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