METHODS OF SUPPORTING A GRAPHENE SHEET DISPOSED ON A FRAME SUPPORT

    公开(公告)号:US20210047740A1

    公开(公告)日:2021-02-18

    申请号:US16987173

    申请日:2020-08-06

    摘要: This disclosure provides systems, methods, and apparatus related to graphene. In one aspect, a method includes submerging a frame support in an etching solution that is contained in a container. A growth substrate, a graphene sheet disposed on the growth substrate, and a primary support disposed on the graphene sheet is placed on a surface of the etching solution. The growth substrate is dissolved in the etching solution to leave the graphene sheet and the primary support floating on a surface of the etching solution. The etching solution in the container is replaced with a washing solution. The washing solution is removed from the container so that the graphene sheet becomes disposed on the frame support.

    METHODS OF SUPPORTING A GRAPHENE SHEET DISPOSED ON A FRAME SUPPORT

    公开(公告)号:US20230012465A9

    公开(公告)日:2023-01-12

    申请号:US16987173

    申请日:2020-08-06

    摘要: This disclosure provides systems, methods, and apparatus related to graphene. In one aspect, a method includes submerging a frame support in an etching solution that is contained in a container. A growth substrate, a graphene sheet disposed on the growth substrate, and a primary support disposed on the graphene sheet is placed on a surface of the etching solution. The growth substrate is dissolved in the etching solution to leave the graphene sheet and the primary support floating on a surface of the etching solution. The etching solution in the container is replaced with a washing solution. The washing solution is removed from the container so that the graphene sheet becomes disposed on the frame support.

    Electron microscope phase enhancement
    5.
    发明授权
    Electron microscope phase enhancement 有权
    电子显微镜相位增强

    公开(公告)号:US07737412B2

    公开(公告)日:2010-06-15

    申请号:US11571980

    申请日:2005-07-12

    IPC分类号: G21K5/04 H01J37/24

    CPC分类号: H01J37/26 H01J2237/2614

    摘要: A microfabricated electron phase shift element is used for modifying the phase characteristics of an electron beam passing though its center aperture, while not affecting the more divergent portion of an incident beam to selectively provide a ninety-degree phase shift to the unscattered beam in the back focal plan of the objective lens, in order to realize Zernike-type, in-focus phase contrast in an electron microscope. One application of the element is to increase the contrast of an electron microscope for viewing weakly scattering samples while in focus. Typical weakly scattering samples include biological samples such as macromolecules, or perhaps cells. Preliminary experimental images demonstrate that these devices do apply a ninety degree phase shift as expected. Electrostatic calculations have been used to determine that fringing fields in the region of the scattered electron beams will cause a negligible phase shift as long as the ratio of electrode length to the transverse feature-size aperture is about 5:1. Calculations are underway to determine the feasibility of aspect smaller aspect ratios of about 3:1 and about 2:1.

    摘要翻译: 微量化电子相移元件用于改变通过其中心孔的电子束的相位特性,同时不影响入射光束的更多发散部分,以选择性地向背面的未散射光束提供九十度相移 物镜的焦点方案,以便在电子显微镜中实现Zernike型聚焦相位对比度。 该元件的一个应用是增加用于在聚焦时观察弱散射样品的电子显微镜的对比度。 典型的弱散射样品包括生物样品,如大分子,或许细胞。 初步的实验图像表明,这些设备确实应用了90度的相位偏移。 已经使用静电计算来确定,只要电极长度与横向特征尺寸孔径的比率为约5:1,散射电子束区域中的边缘场将引起可忽略的相移。 正在进行计算,以确定方面较小的纵横比为约3:1和约2:1的可行性。